Method for regulating and controlling work hardening capability of amorphous/amorphous nano multilayer film
A nano-multilayer, work-hardening technology, applied in metal material coating process, coating, ion implantation plating and other directions, can solve the problems of reducing the strength of amorphous alloys, difficult to achieve, etc., to achieve simple operation, easy implementation, interface clear effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0026] The present invention is a method for adjusting and controlling the work hardening ability of amorphous / amorphous nano-multilayer film. In the magnetron sputtering process, a slow rate deposition process is adopted to change the Zr by controlling the sputtering time. 50 Cu 50 layer and Ni 50 Nb 50 The thickness of the single layer of the layer, Zr with different work hardening ability is obtained 50 Cu 50 / Ni 50 Nb 50 multilayer film. Compared with Zr 50 Cu 50 layer and Ni 50 Nb 50 The multilayer films with layer thicknesses of 15 ± 1.2 nm and 5 ± 0.4 nm were significantly improved. It specifically includes the following steps:
[0027] 1) The single-sided polished single-crystal silicon (100) substrate is ultrasonically cleaned with acetone, alcohol and distilled water respectively, then dried by a hair dryer, placed on the substrate stage of an ultra-high vacuum magnetron sputtering equipment, and prepared for coating; In the best embodiment of the present...
PUM
Property | Measurement | Unit |
---|---|---|
diameter | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com