Method for regulating and controlling work hardening capability of amorphous/amorphous nano multilayer film

A nano-multilayer, work-hardening technology, applied in metal material coating process, coating, ion implantation plating and other directions, can solve the problems of reducing the strength of amorphous alloys, difficult to achieve, etc., to achieve simple operation, easy implementation, interface clear effect

Inactive Publication Date: 2021-12-17
XI AN JIAOTONG UNIV
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Problems solved by technology

[0003] The existing methods to achieve work hardening of amorphous alloys mainly include: (1) use the size effect of the plastic deformation behavior of amorphous alloys to achieve work hardening: due to the expansion of the shear band accompanied by the formation of a new surface, when the shear band expands When the release of elastic energy is less than the increase of its surface energy, the expansion behavior of the shear band will be suppressed, so as to realize the work hardening of amorphous alloys, but this method generally needs to reduce the sample size to 100 nanometers The following, so it is more difficult to realize; (2) By adding a high volume fraction of crystal phase, the expansion behavior of the shear band is suppressed to achieve work hardening of amorphous alloys, but this method greatly reduces The strength of the amorphous alloy

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  • Method for regulating and controlling work hardening capability of amorphous/amorphous nano multilayer film

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Embodiment Construction

[0026] The present invention is a method for adjusting and controlling the work hardening ability of amorphous / amorphous nano-multilayer film. In the magnetron sputtering process, a slow rate deposition process is adopted to change the Zr by controlling the sputtering time. 50 Cu 50 layer and Ni 50 Nb 50 The thickness of the single layer of the layer, Zr with different work hardening ability is obtained 50 Cu 50 / Ni 50 Nb 50 multilayer film. Compared with Zr 50 Cu 50 layer and Ni 50 Nb 50 The multilayer films with layer thicknesses of 15 ± 1.2 nm and 5 ± 0.4 nm were significantly improved. It specifically includes the following steps:

[0027] 1) The single-sided polished single-crystal silicon (100) substrate is ultrasonically cleaned with acetone, alcohol and distilled water respectively, then dried by a hair dryer, placed on the substrate stage of an ultra-high vacuum magnetron sputtering equipment, and prepared for coating; In the best embodiment of the present...

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Abstract

The invention discloses a method for regulating and controlling the work hardening capacity of an amorphous / amorphous nano multilayer film. A first layer of Zr<50>Cu<50> amorphous with the thickness of 5 nanometers is deposited by adopting a magnetron sputtering method; then a second layer of Ni<50>Nb<50> amorphous with the thickness of 5 nanometers is deposited on the first layer of Zr<50>Cu<50> amorphous; and the Zr<50>Cu<50> / Ni<50>Nb<50> amorphous / amorphous nano multilayer film formed by alternate deposition has the remarkable work hardening capacity. According to the invention, the prepared multilayer film is clear in interface, so that the work hardening capacity of the amorphous / amorphous multilayer film can be easily regulated and controlled by controlling the thickness of a single-layer film and the thickness ratio of the two layers, and therefore it is possible to prepare a controllable high-strength and high-work-hardening-capacity amorphous / amorphous nano multilayer film material.

Description

technical field [0001] The invention belongs to the technical field of nanometer metal thin film materials, and in particular relates to a method for regulating the work hardening ability of an amorphous / amorphous nanometer multilayer film. Background technique [0002] Amorphous alloys are different from traditional crystalline materials in that they have the atomic arrangement characteristics of "short-range order and long-range disorder", which determines that amorphous alloys have unique mechanical properties different from crystalline materials, such as high strength, elastic limit, Good match of yield strength and fracture toughness and good room temperature ion irradiation performance. Therefore, amorphous alloys show unique performance advantages in fields requiring high elastic limit, high yield strength and fracture toughness. However, due to the lack of common defects in crystalline materials such as dislocations and twins, the plastic deformation of amorphous al...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C22C9/00C22C27/02C23C14/16
CPCC23C14/352C23C14/165C22C9/00C22C27/02
Inventor 王飞黄平黄丽
Owner XI AN JIAOTONG UNIV
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