Manufacturing method of antidazzle glass
A production method and technology of anti-glare glass, which is applied in the field of anti-glare glass, can solve the problems of uneven graphics, defects on the glass surface, and inability to control the gloss and haze of the glass well, so as to ensure uniformity and uniform size Effect
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Embodiment 1
[0028] A method for making anti-glare glass, comprising the steps of:
[0029] Step 1, glass substrate processing: Cut the glass substrate to 400mm×500mm, and spray a layer of photoresist on the surface of the glass substrate. The photoresist is RZJ2500D positive photoresist with a thickness of 1.5μm. On the photoresist on the surface, dot matrix distribution of protection pattern points is made, the diameter of each protection pattern point is 3 μm, and the distance between two adjacent protection pattern points is 3 μm, forming a complete protection pattern;
[0030] Step 2, substrate photolithography processing: the glass substrate with photoresist protection pattern is firstly cured by soft baking, the curing temperature is 70°C, the baking time is 120s, and then exposure and development are performed in sequence, and then the second hard baking is performed Curing, the curing temperature is 180°C, and the baking time is 16 minutes;
[0031] Step 3, remove the photoresist...
Embodiment 2
[0033] A method for making anti-glare glass, comprising the steps of:
[0034] Step 1, glass substrate processing: Cut the glass substrate to 400mm×500mm, and spray a layer of photoresist on the surface of the glass substrate. The photoresist is RZJ2500D positive photoresist with a thickness of 1.5μm. On the photoresist on the surface, dot matrix-shaped distribution of protection pattern points is made, the diameter of each protection pattern point is 50 μm, and the distance between two adjacent protection pattern points is 50 μm, forming a complete protection pattern;
[0035] Step 2, substrate photolithography processing: the glass substrate with photoresist protection pattern is firstly cured by soft baking, the curing temperature is 120°C, the baking time is 120s, and then exposure and development are carried out in sequence, and then the second hard baking is carried out Curing, the curing temperature is 180°C, and the baking time is 16 minutes;
[0036] Step 3, remove t...
Embodiment 3
[0038] Step 1, glass substrate processing: Cut the glass substrate to 400mm×500mm, and spray a layer of photoresist on the surface of the glass substrate. The photoresist is RZJ2500D positive photoresist with a thickness of 1.5μm. On the photoresist on the surface, dot matrix distribution of protection pattern points is made, the diameter of each protection pattern point is 3 μm, and the distance between two adjacent protection pattern points is 3 μm, forming a complete protection pattern;
[0039] Step 2, substrate photolithography processing: the glass substrate with photoresist protection pattern is firstly cured by soft baking, the curing temperature is 70°C, the baking time is 120s, and then exposure and development are performed in sequence, and then the second hard baking is performed Curing, the curing temperature is 240°C, and the baking time is 16 minutes;
[0040] Step 3, remove the photoresist: use a single acid or mixed acid preparation containing fluoride ions to...
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