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Method for enhancing water vapor barrier property of solar backboard

A water vapor barrier, solar back sheet technology, applied in electrical components, gaseous chemical plating, coatings, etc., can solve the problems of polluted environment, cell oxidation, high water vapor transmission rate

Pending Publication Date: 2022-01-11
SHANGHAI BONA ELECTRONICS TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Polyethylene terephthalate (PET) is the most common backsheet substrate. Under long-term outdoor high-temperature and high-humidity conditions, PET is easily degraded into acids and alcohols, leading to the aging of PET; at the same time, the water vapor of PET itself High transmittance, poor barrier to high humidity environment
Water vapor will penetrate into the inside of the backsheet, deteriorating the adhesion of EVA and causing it to separate from the backsheet, and it will also cause the cells to be oxidized, affecting the power generation efficiency and stability of the module
At the same time, the traditional backplane with multi-layer structure has a cumbersome manufacturing process, many processes, high manufacturing costs, and low production efficiency.
The organic solvents used in the processing will also pollute the environment and increase the energy consumption of the treatment

Method used

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  • Method for enhancing water vapor barrier property of solar backboard
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  • Method for enhancing water vapor barrier property of solar backboard

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] A method for enhancing the water vapor barrier of a solar backsheet, comprising the steps of:

[0038] In the first step, put the 180 micron thick PET substrate into the T-ALD deposition equipment. For the deposition of the inorganic aluminum oxide water blocking film, trimethylaluminum is used as the source of aluminum precursor, and deionized water is used as the oxidizing precursor source, the precursor source was kept at 25°C. Set the heating temperature of the deposition chamber to 120 °C. The flow rate of argon carrier gas is set to 200 standard liters per minute (sccm) when carrying the precursor source into the chamber.

[0039] In the second step, after cleaning the surface of the PET substrate, fix it on the fixture and put it into the chamber, vacuumize and wait for the temperature to stabilize to the set chamber temperature.

[0040] In the third step, aluminum oxide films with a thickness of 30 nanometers are deposited on both sides, and the reaction is s...

Embodiment 2

[0045] A method for enhancing the water vapor barrier of a solar backsheet, comprising the steps of:

[0046] In the first step, put the 250 micron thick PET substrate into the T-ALD deposition equipment. For the deposition of inorganic aluminum oxide water blocking film, trimethylaluminum is used as the source of aluminum precursor, and deionized water is used as the oxidizing precursor Body source and precursor body source are kept at 25°C. Set the heating temperature of the deposition chamber to 120 °C. The flow rate of argon carrier gas is set to 200 standard liters per minute (sccm) when carrying the precursor source into the chamber.

[0047] In the second step, after cleaning the surface of the PET substrate, fix it on the fixture and put it into the chamber, vacuumize and wait for the temperature to stabilize to the set chamber temperature.

[0048] In the third step, aluminum oxide films with a thickness of 20 nanometers are deposited on both sides, and the reaction...

Embodiment 3

[0053] A method for enhancing the water vapor barrier of a solar backsheet, comprising the steps of:

[0054] In the first step, put the 180 micron thick PET substrate into the T-ALD deposition equipment. For the deposition of inorganic aluminum oxide and titanium oxide laminated water-blocking films, trimethylaluminum is used as the source of aluminum precursors, tetrachloride Titanium is used as the source of the titanium precursor, deionized water is used as the source of the oxidizing precursor, and the source of the precursor is kept at 25°C. Set the heating temperature of the deposition chamber to 120 °C. The flow rate of the selected argon carrier gas when carrying the precursor source into the chamber is set to be 200 standard liters per minute (sccm).

[0055] In the second step, after cleaning the surface of the PET substrate, fix it on the fixture and put it into the chamber, vacuumize and wait for the temperature to stabilize to the set chamber temperature.

[00...

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Abstract

The invention discloses a method for enhancing water vapor barrier property of a solar backboard, and the method comprises the following steps of: putting a material used by a supporting base material layer into atomic layer deposition equipment, and depositing an inorganic oxide on the supporting base material layer to obtain an inorganic oxide film upper layer, depositing an inorganic oxide below the supporting base material layer to obtain an inorganic oxide film lower layer, thus obtaining the solar backboard supporting base material with high water vapor barrier property; and then compounding one surface of the solar backboard supporting base material with the high water vapor barrier property with a weather-resistant fluorocarbon film layer material by using a binder to obtain the solar backboard with the high water vapor barrier property. With a commercially available conventional PET base material with the thickness of 180 microns as an example, the water vapor transmission rate of the PET base material is 1.746g / m<2>*24h, and after deposition of aluminum oxide films with the thickness of 30 nanometers on the two sides is carried out on the surface of the PET base material, the water vapor transmission rate of the obtained solar backboard is reduced to 0.005g / m<2>*24h.

Description

technical field [0001] The invention belongs to the technical field of photovoltaic material modification, and in particular relates to a method for enhancing the water vapor barrier property of a solar backboard. Background technique [0002] As a new type of pollution-free green energy, photovoltaic power generation is a powerful means to replace part of thermal power generation to achieve carbon neutrality. In the application of photovoltaic power generation, the smallest basic unit is the solar cell module. The solar backsheet is a kind of packaging material located on the back of the battery module. It needs to protect the module against the erosion of the ethylene-vinyl acetate copolymer (EVA) film and the battery sheet by environmental factors such as light, humidity, and heat in an outdoor environment. Protection and support function to ensure the normal operation of components. [0003] A single material usually cannot meet such comprehensive performance requireme...

Claims

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Application Information

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IPC IPC(8): H01L31/048H01L31/049C23C16/40C23C16/455
CPCH01L31/0481H01L31/049C23C16/45525C23C16/403Y02E10/50
Inventor 许佳辉张圳柳翠袁晓
Owner SHANGHAI BONA ELECTRONICS TECH
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