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A kind of method and its application of cleaning germanium wafer

A wafer and alkaline technology, applied in the field of cleaning germanium wafers, can solve the problems of poor cleanliness of germanium wafers, particles on the crystal surface, white fog, limited application of germanium wafers, etc., and achieves the effect of improving the cleaning degree

Active Publication Date: 2022-04-08
BEIJING TONGMEI XTAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the cleanliness of germanium wafers obtained by this cleaning method is still poor, and there are particles, white fog, etc. on the crystal surface, which limits the application of germanium wafers in solar cells

Method used

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  • A kind of method and its application of cleaning germanium wafer

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0041]A decontamination gel whose raw materials include: 8 kg of ethylenediamine tetraacetic acid, 5 kg of sodium polyacrylate, 25 kg of epoxy resin, 7 kg of surfactant, 5 kg of organic acid, and 15 kg of water;

[0042] Among them, the epoxy resin is water-based epoxy resin emulsion, the model is HY-2168542;

[0043] The organic acid is citric acid;

[0044] The surfactant is lauryl dimethyl betaine.

[0045] A decontamination gel, which is prepared by the following method: adding ethylenediaminetetraacetic acid and an organic acid into water, stirring for 15 minutes, then adding other raw materials, and stirring for 30 minutes to obtain the decontamination gel.

Embodiment 1

[0048] A germanium wafer, which is cleaned by the following method:

[0049] Step S1: In a class 100 clean room, evenly coat the decontamination gel prepared in Preparation Example 1 on the surface of the germanium wafer with a coating amount of 1.5 g / cm 2 , directly heat the decontamination gel on the surface of the germanium wafer with water vapor at 105°C for 20 minutes, naturally cool to 22°C, dry, and remove the decontamination gel;

[0050] Step S2: placing the germanium wafer in an alkaline oxidizing solution and soaking it for 15 minutes, the raw material of the alkaline oxidizing solution includes 5wt% NH with a volume ratio of 3:1 3 , 2wt%H 2 o 2 Aqueous solution; take it out after soaking, and enter the next operation;

[0051] Step S3: placed in 38wt%HBr, 38wt%HCl, 48wt%HF, 68.6wt%HNO with a volume ratio of 1:1.3:0.7:2 3 Soak in the aqueous solution for 20 minutes; take it out after soaking, and enter the next operation;

[0052] Step S4: Rinse the germanium w...

Embodiment 2

[0055] A germanium wafer, which differs from Embodiment 1 in that the level of the clean room in step S1 is Class 1000, and the rest are the same as Embodiment 1.

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Abstract

The application relates to the technical field of cleaning germanium wafers, and specifically discloses a method for cleaning germanium wafers and its application. The method for cleaning a germanium wafer comprises the following steps: step S1: uniformly coating the decontamination gel on the surface of the germanium wafer, directly heating the decontamination gel with water vapor, cooling, drying, and removing the decontamination gel; step S2: applying The germanium wafer is immersed in an alkaline oxidation solution and taken out. The raw material of the alkaline oxidation solution contains NH 3 、H 2 o 2 Aqueous solution; step S3: placed in HBr, HCl, HF, HNO 3 Soak in the aqueous solution and take it out; step S4: rinse the germanium wafer with deionized water at least three times; step S5: dry. The germanium wafers cleaned by the method for cleaning germanium wafers in this application have the advantage of high cleanliness.

Description

technical field [0001] The application relates to the technical field of germanium wafer cleaning, more specifically, it relates to a method for cleaning germanium wafers and its application. Background technique [0002] Germanium is widely distributed in nature. Copper ore, iron ore, sulfide ore and even rocks, soil and spring water contain trace amounts of germanium. Germanium is an element located in Group IVA of the fourth period in the long formula of the periodic table of elements, and its atomic number is 32. It is sandwiched between metals and nonmetals in the periodic table of elements, so that although it belongs to metals, it has many similarities to The properties of non-metals are called "semi-metals" in chemistry. In terms of its conductivity, it is superior to general non-metals and inferior to general metals, so it is called a semiconductor in physics, and germanium is one of the earliest semiconductor devices used. [0003] Germanium has high electron and...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B11/00B08B3/08B08B3/00B08B7/00
CPCB08B11/00B08B3/08B08B3/00B08B7/00
Inventor 任殿胜史铎鹏刘岩
Owner BEIJING TONGMEI XTAL TECH CO LTD