Groove type MOSFET device and preparation method thereof
A trench type, device technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as uncontrollable, Qg and Crss/Ciss instability, affecting device reliability, etc., to improve reliability. , The effect of reducing Crss/Ciss and high process stability
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[0034]Various embodiments of the invention will be described in more detail below with reference to the accompanying drawings. In the various drawings, the same elements are denoted by the same or similar reference numerals. For the sake of clarity, various parts in the drawings have not been drawn to scale. Also, some well-known parts may not be shown. For the sake of simplicity, the semiconductor structure obtained after several steps can be described in one figure.
[0035] When describing the structure of a device, when a layer or a region is referred to as being "on" or "over" another layer or another region, it may refer to being directly above another layer or another region, or between it and Other layers or regions are also included between another layer and another region. And, if the device is turned over, the layer, one region, will be "below" or "beneath" the other layer, another region.
[0036] If it is to describe the situation directly on another layer or ...
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