Method for adjusting friction force of molybdenum disulfide by constructing interface liquid drops
A technology of molybdenum disulfide and single-layer molybdenum disulfide, which is applied in the field of nano-material lubrication, can solve the problems of difficult control of characteristics and increased friction, and achieve the effect of reducing friction, enhancing lubrication performance, and surface cleaning without wrinkles
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Embodiment 1
[0044] A method for constructing interfacial liquid droplets to regulate molybdenum disulfide friction, the steps are as follows:
[0045] (1) Coating: the anisole solution (mass concentration of 10 microliters of polymethyl methacrylate (PMMA) is 4.5%, PMMA relative molecular mass 950K) is evenly spin-coated on the growth there is monolayer molybdenum disulfide The molybdenum disulfide surface of a silicon wafer (0.5cm×0.5cm) was spin-coated at 500rpm for 10 seconds, and then spin-coated at 2000rpm for one and a half minutes. Then anneal in air at 90° C. for 3 minutes to solidify the PMMA to obtain a PMMA / molybdenum disulfide / silicon wafer.
[0046] (2) Etching: immerse the PMMA / molybdenum disulfide / silicon wafer in 3mol / L KOH aqueous solution for etching, and the etching temperature is 160°C. After the etching is completed, the PMMA film with molybdenum disulfide will be separated from the silicon wafer, and the separated PMMA film will be placed in a 3mol / L KOH aqueous sol...
Embodiment 2
[0053] A method for constructing interfacial liquid droplets to regulate molybdenum disulfide friction, the steps are as follows:
[0054] (1) Coating: the anisole solution (mass concentration is 4.5%, PMMA relative molecular mass 950K) of 20 microliters of polymethyl methacrylate (PMMA) is evenly spin-coated on the growth there is monolayer molybdenum disulfide The molybdenum disulfide surface of a silicon wafer (1 cm×1 cm) was spin-coated at 500 rpm for 10 seconds, and then spin-coated at 2000 rpm for one and a half minutes. Then anneal in air at 90° C. for 3 minutes to solidify the PMMA to obtain a PMMA / molybdenum disulfide / silicon wafer.
[0055] (2) Etching: immerse the PMMA / molybdenum disulfide / silicon wafer in 4mol / L NaOH aqueous solution for etching, and the etching temperature is 160°C. After the etching is completed, the PMMA film with molybdenum disulfide will be separated from the silicon wafer, and the separated PMMA film will be placed in a 4mol / L NaOH aqueous s...
Embodiment 3
[0059] A method for constructing interfacial liquid droplets to regulate molybdenum disulfide friction, the steps are as follows:
[0060] (1) Coating: the anisole solution (mass concentration is 4.5%, PMMA relative molecular mass 950K) of 20 microliters of polymethyl methacrylate (PMMA) is evenly spin-coated on the growth there is monolayer molybdenum disulfide The molybdenum disulfide surface of a silicon wafer (1 cm×1 cm) was spin-coated at 500 rpm for 10 seconds, and then spin-coated at 2000 rpm for one and a half minutes. Then anneal in air at 90° C. for 3 minutes to solidify the PMMA to obtain a PMMA / molybdenum disulfide / silicon wafer.
[0061] (2) Etching: immerse the PMMA / molybdenum disulfide / silicon wafer in 3mol / L KOH aqueous solution for etching, and the etching temperature is 160°C. After the etching is completed, the PMMA film with molybdenum disulfide will be separated from the silicon wafer, and the separated PMMA film will be placed in a 3mol / L KOH aqueous sol...
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