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Template passivation process

A template and process technology, which is applied in the field of template passivation technology, can solve the problems of non-densification and uneven passivation of the template surface, and achieve the effects of uniform and dense passivation, good demoulding effect, and good passivation effect

Pending Publication Date: 2022-04-01
THE GBA NAT INST FOR NANOTECHNOLOGY INNOVATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of this, the present application provides a template passivation process, which effectively solves the technical problems of uneven and non-dense passivation of the template surface that exist in the existing passivation process

Method used

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Experimental program
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Effect test

Embodiment 1

[0067] The embodiment of the present application provides a template passivation process, including the following steps:

[0068] 1. Perform plasma treatment on the etched template for 5 minutes, place the processed template in the passivation chamber of the lower watch, and cover the upper watch on the lower watch, so that the upper watch and the lower watch form an airtight The atmosphere space, the atmosphere space includes the passivation chamber and the gasification chamber connected to each other;

[0069] 2. Use a pipette to pipette 25 μL of F13-TCS (trichloro(1H,1H,2H,2H-tridecafluoro-n-octyl)silane and inject it into the gasification chamber from the injection hole, and seal the injection hole with a stopper , F13-TCS drops onto the bottom plate of the gasification chamber;

[0070] 3. Start the heat conduction plate, the heat conduction plate heats the bottom plate of the lower surface dish at a heating rate of 10°C / min, so that the temperature of the bottom plate o...

Embodiment 2

[0074] The embodiment of the present application provides a template passivation process, including the following steps:

[0075] 1. Perform plasma treatment on the etched template for 5 minutes, place the processed template in the passivation chamber of the lower watch, and cover the upper watch on the lower watch, so that the upper watch and the lower watch form an airtight The atmosphere space, the atmosphere space includes the passivation chamber and the gasification chamber connected to each other;

[0076]2. Use a pipette to pipette 25 μL of F13-TCS (trichloro(1H,1H,2H,2H-tridecafluoro-n-octyl)silane and inject it into the gasification chamber from the injection hole, and seal the injection hole with a stopper , F13-TCS drops onto the bottom plate of the gasification chamber;

[0077] 3. Start the heat conduction plate, the heat conduction plate heats the bottom plate of the lower surface dish at a heating rate of 10°C / min, so that the temperature of the bottom plate of...

Embodiment 3

[0080] The embodiment of the present application provides a template passivation process, including the following steps:

[0081] 1. Perform plasma treatment on the etched template for 5 minutes, place the processed template in the passivation chamber of the lower watch, and cover the upper watch on the lower watch, so that the upper watch and the lower watch form an airtight The atmosphere space, the atmosphere space includes the passivation chamber and the gasification chamber connected to each other;

[0082] 2. Use a pipette to pipette 25 μL of 1H, 1H, 2H, 2H-perfluorodecyltrichlorosilane to inject from the injection hole into the vaporization chamber, and seal the injection hole with a stopper, 1H, 1H, 2H, 2H - Perfluorodecyltrichlorosilane dripping onto the bottom plate of the vaporization chamber;

[0083] 3. Start the heat conduction plate, the heat conduction plate heats the bottom plate of the lower surface dish at a heating rate of 10°C / min, so that the temperature...

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Abstract

The invention belongs to the technical field of nanoimprint, and particularly relates to a template passivation process. The invention provides a template passivation process which comprises the following steps: placing a template in a passivation device, continuously introducing gasified fluorochlorosilane into the passivation device, and carrying out passivation reaction on the template to obtain a passivated template; wherein the gas flow rate of the fluorochlorosilane is 1 [mu] L / min to 5 [mu] L / min. According to the method, the flow rate of fluorochlorosilane gas can be controlled at constant temperature, and the gasified fluorochlorosilane in the passivation cavity can continuously, stably and moderately passivate the template, so that the surface of the template is uniformly and compactly passivated. The invention provides a template passivation process. The technical problem that in the existing passivation process, template surface passivation is not uniform and not compact is effectively solved.

Description

technical field [0001] The present application belongs to the technical field of nanoimprinting, and in particular relates to a template passivation process. Background technique [0002] Nanoimprint technology is considered to be one of the most promising micro-nano manufacturing technologies, which can break through the limitation of optical exposure diffraction effect and process nanostructures, and is most likely to become the main technology in the future micro-nano photonics and electronics industries. It can be applied to the low-cost and large-scale production of functional devices with micro-nano structures, especially in the preparation of optical devices, which has unique technical advantages and is currently the most widely used field. The basic process of nanoimprint technology includes three stages: graphic imprinting, graphic transfer, and imprint template release. According to the mode of graphic transfer, there are mainly two methods: hot embossing and ultra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B29C33/38G03F7/00
Inventor 李鹏飞杜有成何益多李晓军
Owner THE GBA NAT INST FOR NANOTECHNOLOGY INNOVATION
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