Solar cell passivation antireflection film and preparation technology and method thereof

A technology of solar cell and preparation process, which is applied in the direction of metal material coating process, sustainable manufacturing/processing, circuit, etc., can solve the problems such as difficult to achieve anti-reflection effect, poor battery passivation effect, low battery efficiency, etc., to achieve Improve photoelectric conversion efficiency, reduce recombination, and prolong life
CN103094366AInactive Publication Date: 2013-05-08SUN YAT SEN UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SUN YAT SEN UNIV
Publication Date
2013-05-08
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a solar cell passivation antireflection film and a preparation technology and a method of the solar cell passivation antireflection film. The preparation technology and the method utilize a plasma enhanced chemical vapor deposition (PECVD), a layer of silicon dioxide film is deposited on the surface of a silicon slice, then a silicon nitride layer with high refractive index is deposited on the prepared silicon dioxide film, and finally a silicon nitride layer with low refractive index is deposited on the silicon nitride layer with high refractive index. The technology and the method have the advantages of being convenient to operate, low in operation cost, good in passivation and good in antireflection performance for the cell surface. The passivation antireflection film prepared by the technology can obviously improve the open circuit voltage, short circuit current and the cell efficiency of the solar cell, compared with a traditional single-layer or double-layer silicon nitride film.
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Description

technical field

[0001] The invention belongs to the technical field of battery sheet processing in the solar battery sheet processing process, and in particular relates to a process for coating the surface of the solar battery sheet. Background technique

[0002] To improve the efficiency of crystalline silicon solar cells, the absorption of sunlight by the silicon substrate should be improved as much as possible, and the reflectivity of the silicon wafer surface should be reduced. In addition to the number of incidents on the surface, one or more layers of anti-reflection coatings can be coated on the surface of the battery. The current industrial mass production method is to use tubular PECVD equipment to deposit a silicon nitride film on the surface of the diffused silicon wafer. Silicon nitride film has two main functions: good anti-reflection effect, reducing the reflectivity of the silicon wafer surface; abundant hydrogen ions in the film can passivate surface dangling...

Claims

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