Skin repairing mask and preparation method thereof

A technology of skin repairing and facial mask, which is applied in the field of skin repairing mask and its preparation, can solve small problems of skin repairing, achieve the effect of lightening skin texture, improving skin quality and improving cortical secretion

Pending Publication Date: 2022-04-12
杨伟业
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Most of the existing facial masks only have the effect of simply replenishing water or whitening, and have little effect on skin repair.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] A skin repair mask, comprising the following components in mass percentage: 85% of nano-bubble small molecule water, 2.85% of chitosan, 10% of glycerin, 2% of xanthan gum, and 0.15% of methylparaben.

[0024] A kind of preparation method of skin restoration mask as described above comprises the steps:

[0025] Step S1: mixing the nanobubble small molecule water and chitosan and placing them under the action of a sterilizer for sterilization to obtain a mixed solution A;

[0026] Step S2: Carry out low-temperature crushing of xanthan gum and methylparaben respectively, and crush them into 16-mesh granules and sieve them for later use;

[0027] Step S3: Inject xanthan gum and glycerin into mixed solution A and keep the temperature in a water bath thermostat at 80°C for 30 minutes, and cool to 65°C during stirring; obtain mixed solution B;

[0028] Step S4: Put the methylparaben in the mixed solution B and continue to stir and cool until the temperature is 48°C; then adju...

Embodiment 2

[0034] A skin repairing facial mask, comprising the following components in mass percentage: 90% of nano-bubble small molecule water, 3% of chitosan, 6% of glycerin, 0.9% of xanthan gum, and 0.1% of methylparaben.

[0035] A kind of preparation method of skin restoration mask as described above comprises the steps:

[0036] Step S1: mixing the nanobubble small molecule water and chitosan and placing them under the action of a sterilizer for sterilization to obtain a mixed solution A;

[0037] Step S2: Carry out low-temperature crushing of xanthan gum and methylparaben respectively, and crush them into 16-mesh granules and sieve them for later use;

[0038] Step S3: Inject xanthan gum and glycerin into mixed solution A and keep the temperature in a water bath thermostat at 80°C for 30 minutes, and cool to 65°C during stirring; obtain mixed solution B;

[0039] Step S4: Put the methylparaben in the mixed solution B and continue to stir and cool until the temperature is 48°C; th...

Embodiment 3

[0045] A skin repair mask, comprising the following components in mass percentage: 94% of nano-bubble small molecule water, 0.78% of chitosan, 5% of glycerin, 0.2% of xanthan gum, and 0.02% of methylparaben.

[0046] A kind of preparation method of skin restoration mask as described above comprises the steps:

[0047] Step S1: mixing the nanobubble small molecule water and chitosan and placing them under the action of a sterilizer for sterilization to obtain a mixed solution A;

[0048] Step S2: Carry out low-temperature crushing of xanthan gum and methylparaben separately, and crush them into 20-mesh granules and sieve them for later use;

[0049] Step S3: Inject xanthan gum and glycerin into mixed solution A and keep the temperature in a water bath thermostat at 80°C for 30 minutes, and cool to 65°C during stirring; obtain mixed solution B;

[0050] Step S4: Put the methylparaben in the mixed solution B and continue to stir and cool until the temperature is 48°C; then adjus...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a skin repairing mask and a preparation method thereof. The mask is prepared from the following components: nano bubble small molecule water, chitosan, glycerol, xanthan gum and methylparaben. The preparation method of the mask comprises the following steps: S1, mixing nano bubble small molecule water and chitosan to obtain a mixed solution A; s2, respectively carrying out low-temperature crushing on xanthan gum and methylparaben; s3, injecting xanthan gum and glycerol into the mixed solution A, keeping the temperature in a water bath thermostat at 80 DEG C for 30 minutes, and cooling to 65 DEG C in the stirring process; a mixed solution B is obtained; s4, putting methylparaben into the mixed solution B, continuously stirring and cooling to 48 DEG C; then adjusting the mixed solution into a viscous liquid; the finished mask is prepared. The mask prepared by the invention can fade erythema, relieve the skin, adsorb heavy metals, repair the skin, replenish water, preserve moisture and fade skin textures on the skin; therefore, dull skin and cortex secretion are improved.

Description

technical field [0001] The invention relates to the technical field of cosmetics, in particular to a skin repair mask and a preparation method thereof. Background technique [0002] With the development of the economy and the continuous improvement of living standards, people have higher and higher requirements for beauty and skin care; on the other hand, with the increase of life and work pressure and environmental pollution, the skin, especially the facial skin, is more and more vulnerable Phenomena such as dark skin, dry skin, and aging skin are bothering more and more people, especially modern women. [0003] At present, in order to meet people's skin care needs, a large number of skin care products have emerged, such as skin care creams, facial masks, etc., among which facial masks have quickly gained everyone's favor due to their effects. Most of the existing facial masks only have the effect of simply replenishing water or whitening, and have less effect on skin repa...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/96A61K8/34A61K8/37A61K8/73A61Q19/00A61Q19/02A61Q19/08
Inventor 佘楚鸿杨伟业
Owner 杨伟业
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap