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Cleaning agent used after texturing of solar silicon wafer and cleaning process thereof

A technology for solar cells and cleaning agents, applied in detergent compositions, detergent compounding agents, inorganic/elemental cleaning compositions, etc., can solve the problems of unstable hydrogen peroxide, large consumption of hydrogen peroxide, and high chemical costs, and achieve cleaning The effect of strong decontamination ability, lower risk and lower cost

Pending Publication Date: 2022-04-12
嘉兴市小辰光伏科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] It is inevitable to introduce impurities such as organic and inorganic substances during the manufacturing process of solar cells. These impurities will form recombination centers when they remain on the surface of silicon wafers, which will inevitably cause losses to the open circuit voltage and short-circuit current of the solar cells, and eventually lead to a decrease in the efficiency of solar cells.
However, in the traditional cell manufacturing process, hydrogen peroxide is used for cleaning after texturing. This cleaning process has the following disadvantages: (1) hydrogen peroxide is a strong oxidizing substance, and there is danger in the use process; (2) hydrogen peroxide Unstable and easily consumed during use, so this cleaning process consumes a large amount of hydrogen peroxide, resulting in high chemical costs

Method used

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  • Cleaning agent used after texturing of solar silicon wafer and cleaning process thereof
  • Cleaning agent used after texturing of solar silicon wafer and cleaning process thereof
  • Cleaning agent used after texturing of solar silicon wafer and cleaning process thereof

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Embodiment Construction

[0030] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.

[0031] A cleaning agent for solar cells after velvet, comprising surfactants, chelating agents, solvents, wetting agents, organic salts and deionized water, mainly composed of the following weight percentages:

[0032]

[0033]

[0034] Preferred technical scheme, described surfactant is nonionic or anionic surfactant, and described nonionic surfactant is cocoate diethanolamine, castor oil polyoxyethylene ether, polyoxyethylene alkylamine, A composition composed of one or two of fatty alcohol polyoxyethylene ether, nonylphenol polyoxyethylene ether, polyoxyethylene polyoxypropylene block copolymer; the anionic surfactant is oleoyloxy One of sodium ethanesulfona...

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PUM

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Abstract

The invention discloses a cleaning agent used after texturing of a solar silicon wafer and a cleaning process thereof, the cleaning agent comprises a surfactant, a chelating agent, a solvent, a wetting agent, an organic salt and deionized water according to a certain weight percentage, and the surfactant, the chelating agent, the solvent, the wetting agent, the organic salt and the deionized water are mixed to prepare the cleaning agent used after texturing of the solar silicon wafer. Alkali is added into deionized water to prepare an alkali solution with the concentration of 0.002-0.06 wt%, hydrogen peroxide with the concentration of 0.005-0.5 wt% is added into the alkali solution, the cleaning agent for the solar cell after texturing is put into the alkali solution to prepare a cleaning solution for the solar cell after texturing, a silicon wafer is put into the cleaning solution for cleaning the solar cell after texturing, the cleaning agent does not volatilize and has no pungent smell, and the cleaning agent can be used for cleaning the silicon wafer after texturing. The cleaning effect is not weaker than that of an original hydrogen peroxide process, the use amount of hydrogen peroxide can be effectively reduced, inorganic particles and organic stains on the surface of the silicon wafer can be effectively removed, and the cost of chemicals and the danger in the using process are greatly reduced.

Description

technical field [0001] The invention relates to the technical field of solar cells, in particular to a cleaning agent and a cleaning process for solar silicon chips after texturing. Background technique [0002] With the depletion of conventional energy sources and the increasingly prominent environmental problems, new energy sources with environmental protection and renewable characteristics have been paid more and more attention by governments of various countries. The development and utilization of new energy sources have become the focus of global attention. Pollution, renewable, non-regional and other advantages are favored by people, and the solar photovoltaic industry has also developed rapidly. [0003] In the solar cell manufacturing process, the texturing process is an extremely important link. The texturing process mainly includes: (1) Pre-cleaning: the purpose is to remove the mechanically damaged layer on the surface of the original silicon wafer and the impurit...

Claims

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Application Information

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IPC IPC(8): C11D1/83C11D3/06C11D3/10C11D3/20C11D3/60H01L31/0236
CPCY02P70/50
Inventor 周浩陈心浩吴家阳彭丽王涛韩军常帅锋
Owner 嘉兴市小辰光伏科技有限公司