Organic g-CNQDs modified CVD single-layer TMDs photoelectric detector and preparation method thereof
A photodetector and single-layer technology, which is applied in photovoltaic power generation, electric solid-state devices, semiconductor/solid-state device manufacturing, etc., can solve problems such as complex integration processes, improve photoresponsivity, broaden spectral response range, and photoresponsivity Improved effect
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Embodiment 1
[0045] Example 1 A kind of organic g-CNQDs modified CVD monolayer MoS 2 Fabrication method of photodetector
[0046] The detector prepared in this example includes a CVD single-layer TMDs film and g-CNQDs covering the surface of the TMDs film, and the single-layer TMDs film is MoS 2 Two-dimensional materials, g-CNQDs are zero-dimensional materials, and the two form a heterojunction to construct a photodetector with a TMDs / g-CNQDs heterostructure. Its preparation method is carried out successively according to the following steps:
[0047] (1) CVD monolayer MoS 2 Photodetector Fabrication
[0048] Ⅰ. Use an analytical balance to weigh 0.8g S powder and 0.002g MoO respectively 3 The powder is placed in two ceramic boats, and placed in the center of the low-temperature zone and high-temperature zone of the CVD tube furnace respectively, and the temperature zone is separated by a temperature isolation plug; the cleaned sapphire growth substrate is placed on the MoO 3 10cm dow...
Embodiment 2
[0063] Example 2 A kind of organic g-CNQDs modified CVD monolayer WS 2 Fabrication method of photodetector
[0064] (1) CVD monolayer WS 2 Photodetector Fabrication
[0065] Ⅰ. Use an analytical balance to weigh 0.8g S powder and 0.02g WO respectively 3 The powder is placed in two ceramic boats, and placed in the center of the low-temperature zone and high-temperature zone of the CVD tube furnace respectively. The temperature zone is separated by a temperature isolation plug, and the cleaned sapphire growth substrate is placed 3 10cm downstream, and put a thermal insulation plug.
[0066] Ⅱ. Seal both sides of the quartz tube, turn on the vacuum pump to extract the air in the tube until the pressure in the tube drops to 8Pa, open the intake valve, fill the quartz tube with high-purity argon to normal pressure, repeat this process 5 times to discharge the residual air in the tube, After the aeration is completed, the gas flow rate is adjusted to 100 sccm until the reaction ...
Embodiment 3-6
[0080] Example 3-6 Preparation method of organic g-CNQDs modified CVD monolayer TMDs photodetector
[0081] Example 3-6 Preparation of g-CNQDs modified CVD monolayer MoS 2 Photodetector, the preparation method is similar to Example 1, the only difference is: g-CNQDs modified CVD monolayer MoS 2 The corresponding technical parameters in the photodetector preparation process are different, see the table below for details.
[0082] Table 1 Technical parameter list
[0083]
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