Surface treatment equipment and treatment method for chip capacitor

A surface treatment, chip-type technology, applied in metal processing equipment, grinding/polishing equipment, metal surface removal regulations, etc. Improve work efficiency and performance, not easy to polish scratches and wear, and contribute to human health

Active Publication Date: 2022-04-26
淮安永捷电子科技有限公司
View PDF5 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the above technical problems, the present invention provides a surface treatment equipment and treatment method for chip capacitors, which solves the problem of the shell of the existing chip capacitors. The structure of the surface grinding equipment is too simple, and it is impossible to deal with the debris and dust in time. It permeates in the air, causing the staff to inhale it, which is not conducive to health. At the same time, debris, dust and other debris are deposited, which affects the grinding efficiency. There are scratches on the surface of the capacitor case, which affects the quality of grinding. In severe cases, there will be wear and tear, which will cause damage to the case, cause economic losses, and reduce the performance of the problem.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Surface treatment equipment and treatment method for chip capacitor
  • Surface treatment equipment and treatment method for chip capacitor
  • Surface treatment equipment and treatment method for chip capacitor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] see Figure 1-6 , the present invention provides a technical solution: a surface treatment equipment for chip capacitors, including a body 1, a linear drive mechanism 2, a lifting mechanism 3, a casing device 4, and a grinding device 5. The linear drive mechanism 2 is arranged on the body 1 The center position of the inner wall top, the lifting mechanism 3 is arranged at the output end of the linear drive mechanism 2, the casing device 4 is arranged at the bottom of the lifting mechanism 3, and the grinding device 5 is arranged inside the casing device 4 and close to the bottom position;

[0036] The central position of the bottom of the inner wall of the body 1 is fixedly connected with a workbench 6, and the bottom of the inner wall of the body 1 and the end near the workbench 6 are all provided with a dust suction mechanism 7, and the chip capacitor device to be polished is fixed on the workbench 6, Reprocess the whole device for preheating, open the lifting mechanis...

Embodiment 2

[0038] The grinding device 5 is provided with a rough grinding roller 51, a fine grinding bar 52, a tension spring 53, a first magnet 54, and a second magnet 55. The rough grinding roller 51 is rotatably connected to the inside of the arc-shaped casing main body 41, and the fine grinding bar 52 slides Connected to the inside of the coarse grinding roller 51 and positioned at the surface position, the tension spring 53 is fixed between the two sides corresponding to the interior of the fine grinding bar 52 and the inside of the rough grinding roller 51, and the first magnet 54 is fixed on the surface of the fine grinding bar 52. side and close to the position of the tension spring 53 , the second magnet 55 is disposed inside the rough grinding roller 51 and close to the position of the first magnet 54 .

[0039] The surface of the coarse grinding roller 51 is provided with a sliding groove compatible with the fine grinding bar 52, and the first magnet 54 and the second magnet 55...

Embodiment 3

[0041] The casing device 4 is provided with an arc-shaped casing main body 41, a tapered opening 42, and a dust removal device 43. The top of the arc-shaped casing main body 41 is fixedly connected with the bottom of the lifting mechanism 3, and the tapered opening 42 is opened on the curved casing main body. 41, the dust removal device 43 is arranged on the top of the arc-shaped casing main body 41 and close to the tapered opening 42;

[0042] The dust removal device 43 is provided with a horn housing 431, an arc guide assembly 432, a filter screen 433, a cleaning device 434, and an air outlet opening 435. The bottom of the horn housing 431 is fixedly connected with the top of the arc-shaped casing main body 41, and the arc guide The flow assembly 432 is fixed on the inner wall of the horn housing 431 and near the tapered opening 42, the filter screen 433 is fixed on the inner wall of the horn housing 431, and the cleaning device 434 is arranged inside the horn housing 431 and...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The surface treatment equipment comprises a machine body, a linear driving mechanism, a lifting mechanism, a housing device and a polishing device, the housing device is arranged at the bottom of the lifting mechanism, and the polishing device is arranged in the housing device and is close to the bottom. The dust removal device is arranged at the top of the arc-shaped housing body and is close to the conical opening, the cambered surface flow guide assembly is fixed to the inner wall of the ox horn shell and is close to the conical opening, the filter screen is fixed to the inner wall of the ox horn shell, and the cleaning device is arranged in the ox horn shell and is close to the filter screen. The invention relates to the technical field of capacitor processing equipment. According to the surface treatment equipment for the chip capacitor, the effect of removing impurities is achieved, the impurities can be removed in time, impurity deposition, polishing scratches and abrasion are not prone to occurring, the polishing quality is high, meanwhile, dust diffusion is reduced, human health is facilitated, safety and reliability are achieved, and the working efficiency and the use performance are improved.

Description

technical field [0001] The invention relates to the technical field of capacitor processing equipment, in particular to surface treatment equipment and a treatment method for chip capacitors. Background technique [0002] Capacitors, usually referred to as capacitance for their ability to hold charges, are denoted by the letter C. Definition: A capacitor, as the name implies, is a 'container for charging', a device that holds charges. Capacitors are one of the electronic components used in large quantities in electronic equipment. A capacitor is two adjacent conductors with a non-conductive insulating medium in between. A capacitor stores charge when a voltage is applied between its two plates. The capacitance of a capacitor is numerically equal to the ratio of the amount of charge on a conductive plate to the voltage between the two plates. The basic unit of capacitance of a capacitor is farad, and capacitors play an important role in tuning, bypassing, coupling, filter...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01G13/06B24B19/00B24B41/04B24B41/06B24B47/12B24B47/04B24B47/22B24B55/06
CPCH01G13/06B24B19/00B24B41/04B24B41/06B24B47/12B24B47/04B24B47/22B24B55/06Y02P70/10
Inventor 董加银
Owner 淮安永捷电子科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap