Ultraviolet light response self-assembly synergistic dielectrophoresis polishing method and device

[0050] The invention is further described below in combination with the accompanying drawings:

[0051] as Figure 1 ~ 10 Shown = a submersible polishing device based on an ultraviolet response self-assembly system, including a first polishing liquid delivery pump 1, a polishing liquid delivery pipe 2, a second polishing liquid delivery pump 14, a polishing box 3, a polishing box upper cover 4, a Y-axis linear module 5, an X-axis linear module 6, a Z-axis linear module 9, a tool device 7, a workpiece to be polished 10, a Y-axis servo motor 11, an X-axis drive motor, a Z-axis drive motor 8, an intracavity light source, an optical control device 12 The viscosity adjusting thin flow layer 13 and the stirring device 15, the polishing box 3 and the upper cover 4 of the polishing box are fixedly connected, the polishing box 3 and the upper cover 4 of the polishing box together form the polishing cavity of the polishing body, the polishing body is placed in the polishing cavity, and the middle of the upper cover 4 of the polishing box is provided with a through hole for the tool device 7 to pass through; The workpiece 10 to be polished is fixed in the polishing cavity of the polishing box 3; The x-axis linear module 6 is provided with a pair arranged in parallel, and two groups of x-axis linear modules 6 are respectively arranged on both sides of the through hole on the upper cover 4 of the polishing box along the x-axis direction. The x-axis driving motor is connected with the x-axis linear module 6 and drives the movement of the sliding block of the x-axis linear module 6; The y-axis linear module 5 is arranged along the y-axis direction, both ends of the base of the y-axis linear module 5 are respectively fixed on the sliding blocks of two X-axis linear modules 6, and the y-axis driving motor 11 is connected with the y-axis linear module 5 and drives the movement of the sliding blocks of the y-axis linear module 5; The base of the z-axis linear module 9 is fixed on the sliding block of the y-axis linear module 5, the z-axis driving motor 8 is connected with the z-axis linear module 9 and drives the movement of the sliding block of the z-axis linear module 9, the tool device 7 is fixed on the sliding block of the z-axis linear module 9, and the lower end of the tool device 7 extends into the polishing cavity through the through hole in the middle of the upper cover 4 of the polishing box; A polishing body is contained in the mixing device 15, the outlet end of the mixing device 15 is connected with the liquid inlet of the second polishing liquid delivery pump 14 through the polishing liquid delivery pipe 2, the liquid outlet of the second polishing liquid delivery pump 14 is connected with the tool device 7 through the polishing liquid delivery pipe 2, and the inlet end of the mixing device 15 is connected with the liquid outlet of the first polishing liquid delivery pump 1 through the polishing liquid delivery pipe 2, The liquid inlet of the first polishing liquid delivery pump 1 is connected with the liquid recovery port arranged at the bottom of the side of the polishing box 3 through the polishing liquid delivery pipe 2; The viscosity regulating thin flow layer 13 is arranged on the polishing solution delivery pipe 2 between the second polishing solution delivery pump 14 and the tool device 7.

[0052] The intracavity light source is fixed on four side walls and one bottom surface of the polishing box 3, the intracavity light source is connected with the light control device 12, the light control device 12 is fixed on the polishing box 3, and the light control device 12 controls the intracavity light source to emit ultraviolet light of different wavelengths.

[0053] An electrode is respectively arranged on the two opposite side walls of the polishing box 3, and the two electrodes are connected with the AC power supply arranged outside the polishing box 3. When the AC power supply is powered on, a non-uniform electric field 16 is generated in the polishing box 3 through two motors to promote the polarization of the liquid phase and solid phase in the polishing body in the non-uniform electric field 16 generated by the motor.

[0054] The tool device 7 comprises a tool housing 706, a vertical rotating motor 704, a rotary table 703, a horizontal rotating motor 702, a movable housing 705 and a diving nozzle 701. The tool housing 706 is fixedly connected with the sliding block of the z-axis linear module 9. The vertical rotating motor 704 is vertically installed in the tool outer housing 706, the motor head of the vertical rotating motor 704 is vertically arranged downward, and the rotary table 703 is fixed on the motor head of the vertical rotating motor 704; The movable housing 705 is wrapped on the outside of the rotary table 703, the horizontal rotating motor 702 is fixed inside the movable housing 705, the motor head of the horizontal rotating motor 702 is arranged horizontally, and the diving nozzle 701 is fixed on the motor head of the horizontal rotating motor 702; When the vertical rotating motor 704 works, it drives the whole composed of the rotary table 703, the horizontal rotating motor 702, the movable housing 705 and the submersible nozzle 701 to rotate with the axis line of the vertical rotating motor 704 as the axis. When the horizontal rotating motor 702 works, it drives the submersible nozzle 701 to rotate with the axis line of the horizontal rotating motor 702 as the axis.

[0055]The diving nozzle 701 comprises a first baffle 7012, a second baffle 7013, a sleeve 7011, a baffle driving motor 7015 and a nozzle body 7014. The outlet of the nozzle body 7014 is provided with a fixed connected second baffle 7013 and a movably connected first baffle 7012. Both the first baffle 7012 and the second baffle 7013 are semi sector baffle plates with the same diameter as the outlet diameter of the nozzle body 7014, The second baffle 7013 is fixed at the outlet of the nozzle body 7014 so that the outlet of the nozzle body 7014 is semi fan-shaped, the baffle driving motor 7015 is fixed on the inner side of the second baffle 7013, a circular hole is arranged in the middle of the second baffle 7013, and the motor head of the baffle driving motor 7015 passes through the circular hole on the second baffle 7013 and is fixedly connected with the first baffle 7012, The sleeve 7011 is fixed on the first baffle 7012 and seals the connection between the first baffle 7012 and the motor head; The motor head of the barrier plate driving motor 7015 is arranged on the same axis as the nozzle body 7014. When the barrier plate driving motor 7015 receives the pulse signal and works, it drives the first barrier plate 7012 to rotate, so as to realize the continuous change of the outlet size of the nozzle body 7014 through the first barrier plate 7012.

[0056] The polishing body is a UV responsive self-assembled polishing solution. The polishing body is composed of photosensitive groups, water and micron sized abrasive particles 17 in a volume ratio of 4:4:1. The photosensitive groups are cetyltrimethylammonium bromide and chlorocinnamic acid photosensitive groups or cationic surfactant propyl bis octadecyl dimethyl ammonium chloride 18-3-18 photosensitive counterion azobenzene-4-benzoic acid or trans-2-methoxycinnamaldehyde photosensitive groups;

[0057] The viscosity adjusting thin flow layer 13 is a flat flow channel with an ultraviolet light source on the side, and the polishing body is irradiated by uniform ultraviolet light in the flat flow channel to complete the viscosity transformation of the polishing body.

[0058] The workpiece to be processed is fixedly connected with the inner base of the polishing box 3 through bolts.

[0059] The cavity light source is an embedded light source. The cavity light source is provided with four side light sources and a bottom light source. The four side light sources are embedded on the inner walls of the four sides in the polishing box 3, and the bottom light source is embedded on the bottom surface in the polishing box 3.

[0060] The light control device 12 controls the wavelength of the light emitted by the intracavity light source to be between 360nm and 460nm.

[0061] The side light source and the bottom light source of the cavity light source are arranged by using a large UV lamp tube in the center and surrounding a small UV lamp tube.

[0062] The abrasive particles 17 of the polishing body are made of silicon carbide material, the abrasive particle size is 50nm ~ 5nm, the abrasive particles account for less than 10% of the total mass fraction of the polishing solution, the dynamic pressure of the polishing solution sprayed from the pump is 0.5 ~ 5MPa, and the temperature of the polishing solution is 15 ° ~ 50 °.

[0063] A diving polishing method based on the UV response self-assembly system, step 1: install the UV response self-assembly polishing solution into the polishing box 3, adjust the wavelength of the light irradiated to the polishing solution through the cavity light source and the light control device 12, and adjust it to meet the viscosity requirements of the polishing solution required by the polishing experiment;

[0064] Step 2: the position of the polishing tool installed on the XYZ three-axis motion platform is controllable. The nozzle of the polishing tool and the workpiece 10 to be polished are immersed in the UV response self-assembly polishing solution, which becomes a self-response polishing solution under the influence of the light source in the cavity;

[0065] Step 3: during polishing, both sides of the polishing box 3 equipped with electrodes are connected with the AC power supply, and the AC power supply is connected with the frequency modulation and voltage regulation controller. The frequency modulation and voltage regulation controller regulates the voltage and frequency of the AC power supply, so that a non-uniform electric field is generated between the two sides of the polishing box 3, so that the ultraviolet light in the polishing box 3 responds to the liquid phase and solid phase in the self-assembled polishing liquid, and polarizes in the non-uniform electric field 16 generated by the electrode;

[0066] Step 4: the polarized liquid phase and solid phase move near the surface of the workpiece to be processed under the action of dielectrophoresis force, so as to increase the liquid phase and solid phase removed from the workpiece material and achieve the polishing effect;

[0067] Step 5: the circulation system is set outside the polishing box 3. The circulation system connects the polishing box 3 and the nozzle of the polishing tool through the polishing liquid delivery pipe 2. The circulation system realizes the recycling of the UV responsive self-assembled polishing liquid during processing

[0068] The power supply voltage of the non-uniform electric field 16 is continuously adjustable at 0 ~ 3000V, and the frequency is intermittently adjustable at 0 ~ 100Hz.

[0069] The above embodiment is only a preferred embodiment of the invention and is not a limitation on the technical scheme of the invention. As long as it is a technical scheme that can be realized on the basis of the above embodiment without creative labor, it shall be deemed to fall into the scope of protection of the patent of the invention.