Phosphorization-free polishing additive and production process thereof
A production process and additive technology, applied in the field of chemical polishing, can solve problems such as unevenness, product surface flow marks, and low production efficiency, and achieve the effects of reducing negative effects, improving uniformity and smoothness, and increasing speed
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[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0032] see Figure 1-6 , the present invention provides a technical solution:
[0033] No phosphating additives, additives at least contain the following components: by mass, sodium hydroxide 300-350g, sodium nitrate 200-250g, sodium polyacrylate 1-2g, sodium silicate 30-50g, corrosion inhibitor 30-50g, surfactant 20-30g, water 500-600g;
[0034]The device used in the production process of the additive comprises a base plate 1, a support leg 2 is arranged on the ...
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