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Phosphorization-free polishing additive and production process thereof

A production process and additive technology, applied in the field of chemical polishing, can solve problems such as unevenness, product surface flow marks, and low production efficiency, and achieve the effects of reducing negative effects, improving uniformity and smoothness, and increasing speed

Active Publication Date: 2022-05-06
东莞市伟元科技有限公司
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  • Abstract
  • Description
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Problems solved by technology

[0003] However, there are still problems with the existing alkaline polishing additives. When the polishing time is long, the additives are more corrosive, and it is easy to cause flow marks on the surface of the product. Flowers, material texture exposure and uneven brightness and other undesirable phenomena, resulting in low product yield and low production efficiency

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  • Phosphorization-free polishing additive and production process thereof
  • Phosphorization-free polishing additive and production process thereof
  • Phosphorization-free polishing additive and production process thereof

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Embodiment Construction

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0032] see Figure 1-6 , the present invention provides a technical solution:

[0033] No phosphating additives, additives at least contain the following components: by mass, sodium hydroxide 300-350g, sodium nitrate 200-250g, sodium polyacrylate 1-2g, sodium silicate 30-50g, corrosion inhibitor 30-50g, surfactant 20-30g, water 500-600g;

[0034]The device used in the production process of the additive comprises a base plate 1, a support leg 2 is arranged on the ...

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Abstract

The invention discloses a non-phosphorization polishing additive and a production process thereof, and the additive at least comprises the following components by mass: 300-350 g of sodium hydroxide, 200-250 g of sodium nitrate, 1-2 g of sodium polyacrylate, 30-50 g of sodium silicate, 30-50 g of a corrosion inhibitor, 20-30 g of a surfactant, and 500-600 g of water. A device adopted in the additive production process comprises a bottom plate and a mixing tank, a feeding mechanism and a mixing mechanism are arranged in the mixing tank, the feeding mechanism is composed of a driving assembly and a plurality of scattering assemblies, and the feeding mechanism and the mixing mechanism are in transmission connection through a transmission assembly. According to the chemical polishing additive, the chemical polishing additive contains sodium hydroxide, sodium nitrate, sodium polyacrylate, sodium silicate, the corrosion inhibitor, the surfactant and water, because the chemical polishing additive does not contain phosphorus, wastewater generated after chemical polishing processing is easy to treat, the negative influence on the environment is effectively reduced, meanwhile, the additive can be in full contact with the surface of a workpiece through the added surfactant, and the surface of the workpiece is protected. Therefore, uniformity and smoothness of workpiece surface treatment are improved.

Description

technical field [0001] The invention relates to the technical field of chemical polishing, in particular to a phosphating-free polishing additive and a production process thereof. Background technique [0002] Aluminum is one of the most important non-ferrous metal materials and is widely used in many fields. In order to meet different application requirements, aluminum products are required to have different surface effects, such as soft sand surface or bright mirror surface, and polishing is an important means to obtain a bright mirror surface. Although mechanical polishing can obtain a flat and smooth surface, due to the pressure and local high temperature operation on the surface of the aluminum product during the mechanical polishing process, the crystal lattice is deformed. It is difficult to obtain the ideal brightness of the oxide film layer, so after mechanical polishing, chemical polishing or electrochemical polishing must be carried out to remove the surface crys...

Claims

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Application Information

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IPC IPC(8): C23F3/02
CPCC23F3/02
Inventor 姜永
Owner 东莞市伟元科技有限公司