Manufacturing method of plasma display screen up and down base plate component element

A plasma and manufacturing method technology, applied in the manufacture of discharge tubes/lamps, electrical components, cold cathodes, etc., can solve the problems of easy breakage of electrode structural units and low yield, and increase ductility and leveling properties, improvement of surface tension, uniform film effect

Inactive Publication Date: 2005-05-04
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this method is that the formed electrode structural unit is prone to breakage and the yield is low.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Prepare a 1% aqueous solution of vinyltriethoxysilane, add an equal amount of isopropanol and acetic acid, put the plasma display (PDP) substrate glass that has been strictly cleaned and annealed into the solution and soak for about 1h (the volume of the solution) Put the container in a constant temperature box at 100°C), take it out, rinse it with pure water, dry it for ten minutes, use the method of screen printing to make electrodes on the treated glass surface, dry it for ten minutes, then perform high temperature heat treatment, and finally Compared with the width of the silver electrode on the obtained upper substrate and the width of the silver electrode on the substrate without soaking treatment, the line width improvement rate reaches 33%.

Embodiment 2

[0030] Prepare a 1% vinyltriethoxysilane ethanol solution, soak the plasma display (PDP) substrate glass that has been strictly cleaned and annealed (at room temperature), and make electrodes by screen printing for about 23 hours. After drying for more than ten minutes, high-temperature heat treatment is finally performed, and the improvement rate of electrode line width reaches 20%.

Embodiment 3

[0032] Soak the plasma display (PDP) substrate glass with a vinyltriethoxysilane solution with a concentration of 99.8% for a while, take it out and dry it, and then use a screen printing paste with striped graphics. It can be clearly seen that the paste is The surface of the substrate is quickly spread out and leveled, and after drying, a dielectric layer with a smooth surface and uniform thickness is obtained.

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PUM

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Abstract

The invention proposes a method for making upper and lower substrate components of a plasma display (PDP). First, the surface of the plasma display (PDP) substrate glass is modified, and the ductility of the slurry on the surface of the substrate glass is controlled to meet the The production requirements of the different components of the upper and lower substrates of the plasma display (PDP), and then use the method of screen printing to make electrodes, barriers, dielectric layers, etc. The electrodes and barrier patterns produced by this method have low disconnection rate and high precision, and the surface of the produced dielectric layer is smooth and uniform in thickness; at the same time, because the treated substrate glass is washable, it can be stored for a period of time, and to a certain extent The production process is simplified and the production efficiency is improved. The method proposed by the invention not only inherits the advantages of low production cost of the thick film and is suitable for mass production, but also improves the production quality to a certain extent.

Description

1. Technical field [0001] The invention relates to the manufacture of flat panel displays, and relates to a method for manufacturing upper and lower substrate components of a plasma display screen (PDP), such as making electrodes, barriers and media. 2. Background technology [0002] According to the search data of the applicant, the technical data related or close to the present invention are as follows: [0003] 1. A known method for making electrode components of plasma display screens is the method of thin film photolithography, that is, a layer of metal film is evaporated on the entire substrate surface, and then patterns (electrodes) are formed by photolithography, (French Patent No. 2169912 HOIJ 9 / 00 Op.01.02.1973). The disadvantages of this method are high cost, long production cycle and low yield. [0004] 2. Using the combination of thin film technology and thick film technology, apply photosensitive resin on the clean substrate, expose and develop, leave the gro...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J9/00H01J9/02
Inventor 徐伟军陈瑜孙鉴
Owner XI AN JIAOTONG UNIV
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