Inert gas displacement method and device, exposure device and graticule sheet device
A technology of inert gas and reticle, which is applied in the direction of photolithography exposure device, transportation and packaging, microlithography exposure equipment, etc., can solve the problems of film deformation and damage, exposure light absorption, etc.
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no. 1 example
[0060] Figure 5 It is a schematic diagram showing a purification mechanism for purifying a thin film space with an inert gas according to the first embodiment of the present invention.
[0061] Figure 5 The middle sealed chamber 36 is equivalent to figure 1 The housing 8 of the reticle stand 1 or the temporary storage 18 of reticle is contained in the reticle, so the inert gas is introduced through the inert gas supply channel 34, and the inert gas is discharged through the inert gas outlet channel 35, so that the sealed chamber 36 passes The inert gas is purified.
[0062] From the viewpoint of maintaining the transmittance of exposure light, the concentration of oxygen and moisture in the sealed chamber 36 should be 1-100 ppm, preferably 10 ppm or less. However, since the sealed chamber 36 is equipped with unillustrated markings Since a space with a large capacity for actuators such as a sheet conveying device, it is difficult to control the concentration of oxygen and mois...
no. 2 example
[0081] In the above-mentioned first embodiment, the inert gas filled in the substantially closed space 39 is discharged from the inert gas discharge channel 41. A slight gap may also be provided between the reticle 23 and the reticle support table 28 to prevent Inert gas is discharged there. Reference Figure 9A (Cross-sectional view) The second embodiment of the present invention will be explained.
[0082] The inert gas is supplied to the reticle support table 28 from the inert gas supply channel 40. The supplied inert gas penetrates the substantially closed space 39 through the porous plate 28a. At this time, since the perforated plate 28a is passed, the inert gas is uniformly supplied into the substantially closed space 39.
[0083] The reticle support portion 29 of the reticle support table 28 supports three or four places of the reticle 23. Such as Figure 9B As shown in (side view), a small gap is provided outside the contact portion 47 with the reticle 23. Due to the press...
no. 3 example
[0086] In the above-mentioned first and second embodiments, the inert gas is supplied from an arbitrary place or underside in a relatively substantially closed space 39. However, it can also be supplied to the substantially closed space through the vicinity of the vent 27 of the film frame. Space 39. Reference Picture 10 The third embodiment of the present invention will be explained.
[0087] The inert gas is supplied from the inert gas supply passage 40 to the substantially closed space 39. At this time, since the inert gas is supplied from the vicinity of the vent hole 27 of the film frame, the oxygen and moisture that have moved from the film space through the vent hole 27 to the outside of the film space due to gas diffusion can be efficiently removed at the inert gas discharge port. Moreover, it is often possible to increase the concentration of the inert gas near the vent holes 27 of the membrane frame to efficiently purify the membrane space. Can also be like Picture 11 ...
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Abstract
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