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Method and apparatus for measuring and analyzing structure and component of combined sample

A technology for measuring and analyzing samples, applied in the field of measuring and analyzing the structure and composition of combined samples and devices, which can solve the problems of inability to measure polycrystalline samples, large divergence of incident light, and unfocused X-rays, etc., and achieve fast measurement speed , Small incident light spots, simple operation

Inactive Publication Date: 2006-08-16
UNIV OF SCI & TECH OF CHINA
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  • Abstract
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AI Technical Summary

Problems solved by technology

Because of the large divergence of incident light, it can only be used for the structural measurement of single crystal or epitaxial film samples, and cannot measure polycrystalline samples (see M. Ohtania, etc. Concurrent x-ray diffractometer for high throughput structural diagnosis of epitaxial thinfilms , Appl. Phys. Lett. 79, P3594-3596, 2001)
[0008] Although the above technologies can be adopted by general laboratories, each has its own advantages and disadvantages: the advantage of scheme ① is that the slow mechanical linkage scanning is canceled, and the disadvantage is that the X-rays are not focused; the advantage of scheme ② is that the X-rays are focused, but the scanning The speed is slow; scheme ③ can only be applied to single crystal or epitaxial samples

Method used

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  • Method and apparatus for measuring and analyzing structure and component of combined sample
  • Method and apparatus for measuring and analyzing structure and component of combined sample
  • Method and apparatus for measuring and analyzing structure and component of combined sample

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Embodiment Construction

[0032] The X-ray generator used in the X-ray source 1 is an X-ray diffractometer model BDX3200 of Beida Jade Bird Company, and the X-ray tube is a Cu target X-ray tube of Dandong Ray Instrument Group Company, model XJ10-60N.

[0033] The X-ray lens 3 uses X-ray capillary beam micro-converging lens, which is designed and manufactured by Beijing Normal University. It can focus the divergent white light X-rays into quasi-parallel white light X-ray micro-converging beams. The front focal length is 67mm and the back focal length is . 263mm, the light intensity gain is 10.

[0034] The sample stage 7 and its control circuit adopt TSA50-C precision three-dimensional translation stage and SC3 stepping motor controller of Beijing Zhuoli Hanguang Company.

[0035] The energy detector 9 and its measurement circuit adopt the XR-100CR solid state detector, PX2T / CR power supply and signal amplifier, and MCA8000A multi-channel analyzer of American Amptek Company.

[0036] The precision adju...

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Abstract

The invention relates to a process and apparatus for measuring and analyzing the structure and component of a combination sample, wherein an X-ray source and an X-ray lens form incident light path, an energy detector is arranged on the diffraction light path, the divergent white light set out by the X-ray source is focused into parallel micro convergent beams onto the sample platform through an X-ray lens, then an energy detector receives the diffracted X-rays and fluorescent X-rays from the tested sample, and transmit them into the computer for data processing, thus obtaining the diffraction spectrum and fluorescence spectrum and analyzing the structure and constitution.

Description

Technical field: [0001] The invention relates to a method and a device for measuring and analyzing structures and components by using X-ray diffraction and X-ray fluorescence techniques simultaneously. Background technique: [0002] At present, when analyzing the crystal structure and composition of materials, X-ray diffraction technology is usually used. The most conventional one is angle dispersive X-ray diffraction (XRD for short), which uses single-wavelength X-rays (monochromatic light, monochromatic before or after diffraction) to irradiate the material sample, so that the distance between the sample surface and the detector is θ -2θ continuous scanning, obtained to satisfy the diffraction formula 2dsinθ=λ 0 Diffraction pattern of (d is crystal plane distance, is the structure parameter of sample material, θ is diffraction angle, λ 0 is the wavelength of X-rays), that is, the relationship curve between the diffraction intensity and the diffraction angle θ, and then c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N23/20G01N23/223
Inventor 高琛罗震林
Owner UNIV OF SCI & TECH OF CHINA
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