High-frequency high-power multi-waveform power supply for differential arc oxidization

A micro-arc oxidation, high-power technology, applied in output power conversion devices, DC power input into DC power output, electrical components and other directions, can solve the problem of large volume, high energy consumption, and the output waveform cannot be continuously adjusted in a wide range, etc. question

Inactive Publication Date: 2007-04-11
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to overcome the defects of high energy consumption, low efficiency, large volume and the inability to continuously adjust the output waveform in a wide range in the existing power supply for micro-arc ox

Method used

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  • High-frequency high-power multi-waveform power supply for differential arc oxidization
  • High-frequency high-power multi-waveform power supply for differential arc oxidization
  • High-frequency high-power multi-waveform power supply for differential arc oxidization

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specific Embodiment approach 1

[0005] Specific Embodiment 1: The present embodiment will be specifically described below with reference to FIG. 1 . It consists of the same two DC power supplies, the same four power switches, the same four isolated drive circuits and the single chip microcomputer 3, the first power switch K1 to the fourth power switch K4 are all insulated gate bipolar transistors, the first direct current The positive pole of the current power supply E1 is connected to the collector of the first power switch K1, the emitter of the first power switch K1 is connected to one end of the micro-arc oxidation working tank 1 and the collector of the second power switch K2, and the other end of the micro-arc oxidation working tank 1 One end is connected to the emitter of the third power switch K3 and the collector of the fourth power switch K4, the collector of the third power switch K3 is connected to the positive pole of the second DC power supply E2, and the negative pole of the second DC power sup...

specific Embodiment approach 2

[0006] Specific Embodiment 2: The present embodiment will be specifically described below with reference to FIG. 5 and FIG. 6 . The difference between this embodiment and Embodiment 1 is that the first DC power supply E1 and the second DC power supply E2 are respectively composed of an EMI and rectification circuit 5-1, a power factor correction circuit 5-2, a switch adjustment circuit 5-3, and a rectification circuit 5-1. The filter circuit 5-4 and the control circuit 5-5 are composed, the input end of the EMI and rectification circuit 5-1 is connected to the AC power supply, the output end of the EMI and rectification circuit 5-1 is connected with the input end of the power factor correction circuit 5-2, The output end of the power factor correction circuit 5-2 is connected to one input end of the switch adjustment circuit 5-3, the other input end of the switch adjustment circuit 5-3 is connected to the output end of the control circuit 5-5, and the switch adjustment circuit ...

specific Embodiment approach 3

[0007]Specific Embodiment Three: The present embodiment will be specifically described below in conjunction with FIG. 7 . The difference between this embodiment and the second embodiment is that the control circuit 5-5 is implemented by PWM control and frequency adjustment circuit 5-5-1, the same two minimum and maximum pulse width limiting circuits 5-5-2 and the same Composed of two isolated drive circuits 5-5-3, the PWM control and frequency adjustment realization circuit 5-5-1 consists of three integrated operational amplifiers, a PWM integrated control chip U1 of model UC3825, nine resistors, two potentiometers, Composed of three capacitors, transistor Q1 and No. 51 diode D51, one end of No. 6 resistor R6 is connected to the output end of rectifier filter circuit 5-4, the other end of No. One end of R7 is connected to the inverting input end of No. 1 integrated operational amplifier A1, the other end of No. 7 resistor R7 is connected to one end of No. 3 capacitor C3, the o...

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Abstract

This invention discloses a power supply used in oxidation of differential of arc composed of DC suppliers (E1, E2), power switch (K1-K4), isolation drive circuits (2-1~2-4) and a single chip computer, among which, positive of E1 is connected with the collector of K1, which emit pole is linked to one end of differential of arc oxidation working groove (1) and collector of K2, the other end of (1) is linked to emitting pole of K3 and collector of K4, collector of K3 to positive of E2, its negative to the emit pole of K4, emit pole of K2 and negative of E1 are connected to the earth, the single-chip computer controls the power switch by the isolation drive circuit. This invention applies a high frequency switch device 'an isolation grating double-pole transistor' as the power switch and gives up the industrial frequency transformer.

Description

technical field [0001] The invention belongs to a power supply, in particular to a high-frequency high-power multi-waveform power supply. Background technique [0002] Micro-arc oxidation technology can treat the surface of aluminum, magnesium, titanium, tantalum and other valve metals to form a layer of ceramic film on the surface. This kind of ceramic film has the characteristics of wear resistance, corrosion resistance, thermal shock resistance, etc., and can be widely used in chemical industry, machinery, automobile, electronics, aerospace and other fields. This technology controls the composition structure and thickness of the membrane by controlling the electrical parameters and adjusting the composition of the electrolyte. In practical industrial applications, high-power micro-arc oxidation process power supplies at home and abroad generally use thyristor rectifier power supplies. In order to obtain reliable negative resistance characteristics and stable working curr...

Claims

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Application Information

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IPC IPC(8): H02M3/155H02M3/335
Inventor 贲洪奇姜兆华李延平辛世刚王福平
Owner HARBIN INST OF TECH
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