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Display device and reflction preventing substrate

A display device and anti-reflection technology, which is applied in identification devices, sputtering plating, ion implantation plating, etc., can solve the problem of deterioration of anti-reflection film or anti-reflection film, poor moisture penetration resistance of anti-reflection film The effects of stabilizing film thickness and optical properties, suppressing moisture release, and achieving thin film reduction

Inactive Publication Date: 2007-08-01
SONY CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The release of gas due to this moisture will increase the residual gas in the film forming chamber, reduce the film forming rate, and adversely affect the film forming
[0010] On the other hand, conventional anti-reflection films, for example, in the structure of anti-reflection films formed of four-layer films composed of silicon oxide film and titanium oxide film on a substrate formed of PET film, the anti-reflection film itself has Poor moisture permeability
Therefore, if it adheres to the CRT screen, under high temperature and high humidity environment, the deterioration, peeling and falling off of the anti-reflection film or the anti-reflection film itself will occur.

Method used

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  • Display device and reflction preventing substrate
  • Display device and reflction preventing substrate
  • Display device and reflction preventing substrate

Examples

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preparation example Construction

[0076] An example of the preparation method of the anti-reflection film 11 is given. The surface of the transparent substrate 12 in O 2 , Ar, N 2 atmosphere, or selected from O 2 , Ar, N 2 The glow discharge treatment is carried out in one or both of the atmospheres to activate the surface of the lining material 12 . Next, in order to obtain a stronger adhesive force between the substrate 12 and the anti-reflection film 18, the first layer of film 13 is formed of, for example, SiO X membrane. Due to SiO X The film 13 absorbs little light, and as a transparent optical film, it is preferable that the film thickness is 10 nm or less. It is preferable to make the light absorption of the first film 13 as small as possible. The optimum condition range when the first layer film 13 is formed of a single-layer film is preferably a light transmittance region of 86% to 92% that can be realized as a high transmittance.

[0077] The high-refractive-index, high-resistance second fil...

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PUM

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Abstract

The present invention provides an antireflection substance such as an antireflection film having a low moisture-permeable characteristic, high quality and high reliability, and also provides a display apparatus comprising this antireflection substance. The antireflection substance according to the present invention includes an antireflection film formed on a transparent substrate, the antireflection film being composed of a multiple layer in which a first layer serving as an adhesion-improving layer, a second layer serving as a barrier layer against moisture, a third layer, a fourth layer and a fifth layer are laminated in this order, and in which the second layer and the fourth layer are each set to have a refractive index higher than that of the third layer and the fifth layer. The display apparatus according to the present invention comprises this antireflection substance on its display surface.

Description

technical field [0001] The present invention relates to a display device provided with a so-called anti-reflection base such as an anti-reflection film or an anti-reflection substrate on a display surface, and the anti-reflection base. Background technique [0002] For example, in a display device equipped with a cathode ray tube or the like, an antireflection film is attached to the display surface in order to achieve high image quality such as reducing reflection of ambient light or improving contrast. The antireflection film is formed by forming an antireflection film on a transparent substrate. [0003] A conventional antireflection film is known to be composed of a laminate of silicon oxide and titanium oxide. Fig. 1 shows a conventional general antireflection film. Such an antireflection film 1 is, for example, formed by sequentially laminating the following four-layer films on one side of a transparent substrate 2 formed of a resin substrate (film) such as polyethyl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/11G02B1/10B32B7/02C23C14/06G02B1/115G02B1/16G09F9/00
CPCG02B1/115G02B1/11
Inventor 渡边一夫
Owner SONY CORP
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