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Polishing method of diamond material

A diamond and polishing disc technology, which is applied in the direction of polishing machine tools, metal processing equipment, manufacturing tools, etc., can solve problems such as limited roughness, achieve good polishing surface quality, improve polishing efficiency, and reduce polishing costs

Inactive Publication Date: 2007-08-15
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in this method, a pre-polishing must be carried out before the two films are lapped to achieve better results; the final roughness obtained by using this polishing method is limited.

Method used

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  • Polishing method of diamond material

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0064] The diamond material is CVD diamond film, the surface roughness is 3-8μm, and the polishing area is 1.1cm 2 ; Polishing dissolved salt oxidant composed of LiNO 3 +KNO 3 , molar ratio (0.43-0.4): (0.57-0.60), melting point 130°C. The pressure is 0.2MPa, the rotation speed of the polishing disc is 81RPM, the cast iron disc, the grinding disc temperature is 150°C, and the surface roughness Ra value after polishing reaches 0.4m.

Embodiment 2

[0066] The diamond material is CVD diamond film, the surface roughness is 3-8μm, and the polishing area is 1.1cm 2 ; Polishing dissolved salt oxidant composed of LiNO 3 +KNO3 , molar ratio (0.43-0.4): (0.57-0.60), melting point 130 ° C; LiNO 3 +KNO 3 , aluminum disc, grinding disc temperature 150 ℃.

[0067] As shown in Figure 2, the comparison uses NaOH, KNO 3 ,NaOH+KNO 3 Comparison of material removal rate of diamond film polished by three substances as oxidant (temperature 320°C). From these four kinds of methods, use technique of the present invention and dissolved salt oxidant LiNO at lower temperature 3 +KNO 3 the largest amount of removal.

Embodiment 3

[0069] The diamond material is natural single crystal diamond with a surface roughness of 0.2; the composition of the polished dissolved salt oxidant is LiCL+LiNO 3 +NaNO 3 , molar ratio 0.05:0.80:0.15, melting point 174°C. The pressure is 0.3MPa, the speed is 150RPM, the cast iron disc, and the Ra value reaches 0.02m.

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Abstract

Said invention discloses a polishing method for diamond material, which is that, salts material are added in the polish disc, diamond material is pressed on polish disc by pressure, rotating polish disc and keeping salts material contact with diamond material to make diamond material surface to be leveled and polished. The advantage is that, the mixed fused salts are used as oxidant, grooved polish disc is used, through mechanical and chemical action and at lower temperature the polish rate is raised, the cost is reduced, and better polish quality is obtained.

Description

technical field [0001] The invention relates to a diamond material polishing method. Background technique [0002] Diamond film is a kind of all-crystalline, polycrystalline pure diamond material, which has the basic properties of natural diamond; diamond-like film refers to an amorphous carbon film containing a diamond structure, and its performance is very close to that of pure diamond. Diamond film and diamond-like film have high hardness and wear resistance, good thermal conductivity, insulation, optical properties, chemical stability and doping-induced semiconductor properties, etc., as an excellent engineering structural material and functional material, It has a very broad application prospect in many fields such as decoration, electronics, optics, machinery, and optics. During the deposition process of diamond film and diamond-like film, due to the preferential growth of crystals along certain crystal planes, problems such as uneven thickness, unequal particle size,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B24B39/06
Inventor 王成勇张凤林陈春林匡同春
Owner GUANGDONG UNIV OF TECH
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