Positve photosensitive painting composition, method for producing positive photosensitive resin and forming method of pattern
A technology of photosensitive resin and photosensitivity, which is applied in the field of positive photosensitive coating composition and protective layer, and can solve the problems of insufficient solubility difference of alkaline developer, reduced sensitivity, and reduced graphic formability, etc.
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[0101] The present invention will be described in more detail by enumerating examples below.
[0102] "Parts" and "%" are based on weight. The present invention is not limited by the following examples.
[0103] The following abbreviations are used for the following chemical substances. Its content is expressed as follows.
[0104] IEM: Isocyanoethyl methacrylate
[0105] DMFDG: Dipropylene glycol dimethyl ether
[0106] ADVN: 2,2-Azobis(2,4-Dimethylvaleronitrile)
[0107] NAU-8: 1,2-Naphthoquinone-2-diazido-5-sulfonic acid-N-methyl-N-(2-hydroxyethyl)amide (manufactured by Toyosei Co., Ltd.)
[0108] NMP: N-methyl-2-pyrrolidinone (pirolidinone)
[0109] DBTDL: dibutyltin dilaurate
[0110] PABA: para-aminobenzoic acid
[0111] Manufacture of positive photosensitive resin
manufacture example 1
[0113] Under nitrogen flow, add DMFDG335 parts into a 4-necked flask, and after stirring while raising the temperature to 117°C, add the following mixture dropwise within 3 hours:
[0114] Styrene 60 parts
[0115] 150 parts of methyl methacrylate
[0116] 115 parts of n-butyl acrylate
[0117] 33 parts of n-butyl methacrylate
[0118] 142 parts of isocyanoethyl methacrylate
[0119] ADVN 17 parts
[0120] Thereafter, a mixture of 45 parts of ADVN and 180 parts of DMFDG was added dropwise over 3 hours and kept for 1 hour. After the temperature dropped to 60°C, 85 parts of NAU-8, 125 parts of DMFDG, and 130 parts of NMP were added, stirred for 1 hour, and DBTDL500PPM was added to continue stirring for 1 hour. Thereafter, 85 parts of PABA, 70 parts of DMFDG, and 15 parts of NMP were added and stirred for 4 hours to obtain a positive photosensitive resin solution having a resin solid content of 52% and a Gardner viscosity of Z3Z4. The solid content of the obtained resin had...
manufacture example 2
[0122] Under nitrogen flow, 335 parts of DMFDG were added into a 4-necked flask, and after the temperature was raised to 117°C while stirring, the following mixture was added dropwise within 3 hours:
[0123] Styrene 60 parts
[0124] 150 parts of methyl methacrylate
[0125] 115 parts of n-butyl acrylate
[0126] 40 parts of n-butyl methacrylate
[0127] 135 parts of isocyanoethyl methacrylate
[0128] ADVN 17 parts
[0129] Thereafter, a mixture of 45 parts of ADVN and 180 parts of DMFDG was added dropwise over 3 hours and kept for 1 hour. After the temperature dropped to 60°C, 74 parts of NAU-8, 116 parts of DMFDG, and 128 parts of NMP were added, stirred for 1 hour, and DBTDL500PPM was added to continue stirring for 1 hour. Thereafter, 85 parts of PABA, 70 parts of DMFDG, and 15 parts of NMP were added and stirred for 4 hours to obtain a positive photosensitive resin solution having a resin solid content of 51% and a Gardner viscosity of Z4. The obtained resin had an...
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