Epoxy composition for light semiconductor packing
A technology of optical semiconductor and epoxy resin, which is applied in the direction of semiconductor devices, semiconductor/solid-state device parts, electric solid-state devices, etc., can solve the problems of poor heat resistance, reliability of optical semiconductor components, high moisture absorption rate, etc., and achieve high durability Ultraviolet light, excellent light transmittance, low moisture absorption effect
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[0071] Example
[0072] Each component used in embodiment and comparative example is described in detail as follows:
[0073] epoxy resin a: Bisphenol A type polyglycidyl ether produced by Changchun Artificial Resin Factory and sold under the trade name BE-501, its epoxy equivalent weight (EEW) is about 500g / eq.
[0074] epoxy resin b : Polyglycidyl ether of cresol-aldehyde condensate produced by Changchun Artificial Resin Factory and sold under the trade name CNE 200ELA, its epoxy equivalent weight is about 200 to 220g / eq, and the hydrolyzable chlorine is below 200ppm.
[0075] epoxy resin c : Triglycidyl ether of isocyanurate sold under the trade name TEPIC, produced by Nissan Chemical Institute, Japan, and its epoxy equivalent weight is about 100g / eq.
[0076] hardener : Hexahydrophthalic anhydride sold under the trade name HHPA, produced by Nippon RIKEN, with an acid content of about 154g / eq.
[0077] hardening accelerator : 2-methylimidazole.
[0078] Antiox...
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[0079] Synthesis Example 1- Epoxy resin d (epoxy resin of formula (1) of the present invention)
[0080] In a stainless steel autoclave with electromagnetic stirring, 40 grams of epoxy resin b (CNE-200ELA, EEW=200, manufactured by Changchun Artificial Resin Factory Co., Ltd.), 120 grams of THF, and commercially available 5wt% Ru-C catalyst were placed 0.6 g, the reaction kettle was sealed, and hydrogen was introduced to make the pressure 5.0 MPa, the reaction temperature was controlled at 60°C, and the reaction time was 8 hours. After the reaction, the catalyst was filtered, and then the solvent was evaporated under vacuum at 150° C. to obtain the hydrogenated epoxy resin (epoxy resin d) of the aromatic ring of the structure of formula (1), the hydrogenation rate of the benzene nucleus was 84.8%, EEW=263 , loss rate of epoxy group = 24%.
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