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Photosensitive resin composition for isolator

A technology of photosensitive resin and spacer, which is applied in the direction of photosensitive materials, optics, and optomechanical equipment used in optomechanical equipment. Orientation, sufficient voltage retention, and effect of reducing defects

Active Publication Date: 2010-04-21
DONGJIN SEMICHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, if the spacer or the alignment film is peeled off due to the above-mentioned friction, a display defect will occur; if there is a residue originating from the photosensitive resin composition on the alignment film, abnormality in the orientation of the liquid crystal will also occur.
In addition, in liquid crystal screens and touch screens, since the spacer is in direct contact with the liquid crystal, if ionic substances or impurities are eluted from the spacer, the voltage retention rate will be reduced.

Method used

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  • Photosensitive resin composition for isolator
  • Photosensitive resin composition for isolator
  • Photosensitive resin composition for isolator

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0065] 30% by weight of an alkali-soluble acrylate resin, 5% by weight of a urethane resin represented by the above chemical formula 4, and 5% by weight of a crosslinkable monomer having at least two ethylenic double bonds represented by the above chemical formula 5 The indicated urethane monomer, 0.5% by weight of Irgacure 907 (manufactured by Ciba Chemical Specialty Products Co., Ltd.) as a photopolymerization initiator, 0.2% by weight of 4,4-bisdiethylaminobenzophenone, 37% by weight of As a solvent, propylene glycol methyl ether acetate, 17% by weight of ethyl 3-ethoxypropionate, and 5.3% by weight of butyl acetate were uniformly mixed to manufacture a liquid photosensitive resin composition for spacers.

Embodiment 2～4 and comparative example 1～3

[0067] Except having used the component and composition ratio shown in following Table 1 in said Example 1, it implemented by the method similar to said Example 1, and manufactured the liquid photosensitive resin composition for spacers. In this case, the unit in Table 1 is "% by weight".

[0068] Table 1

[0069]

[0070] Table 1 will be described below.

[0071] Alkali-soluble acrylate resin:

[0072] Benzyl methacrylate: methacrylic acid: methyl methacrylate = 60: 20: 20

[0073] Molecular weight: 20,000.

[0074] In chemical formula 1 and chemical formula 2:

[0075] R 1 = methyl, R 2 =methylene, a:b:c=20:20:60, molecular weight: 20,000.

[0076] In chemical formula 4:

[0077] R 3 = 1,6-hexylene, R 4 , R 5 =Methyl group, molecular weight: 3,000.

[0078] In chemical formula 5:

[0079] R 6 = methylene, R 7 =-C(CH 3 ) 2 C 6 h 4 C(CH 3 )=CH 2 , y=6, z=2.

[0080] Using the photosensitive resin compositions for spacers produced in Examples 1 to 4 and C...

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Abstract

To provide a photosensitive resin composition for spacers capable of reducing defects in an unfilled region due to a dropping amount of a liquid crystal, capable of preventing damage by pressure on acolor filter, capable of suppressing thickness variation which is unavoidable in a process, free from leaching of ions or impurities in a liquid crystal, not lowering voltage retentivity, having no effect on liquid crystal alignment, and capable of forming spacers excellent in rubbing resistance, having satisfactory voltage retentivity and liquid crystal aligning property, and excellent in developability, high sensitivity, heat stability, dimensional stability and compressive strength. The photosensitive resin composition for spacers comprises (a) a resin selected from the group consisting of(i) an alkali-soluble acrylate resin, (ii) a photopolymer resin and (iii) a mixture of these, (b) a urethane resin, (c) a crosslinkable monomer having at least two or more ethylenic double bonds, (d)a photopolymerization initiator and (e) a solvent.

Description

technical field [0001] The present invention relates to a photosensitive resin composition for a spacer, and more particularly to a photosensitive resin composition for a spacer as described below, which can not only reduce the occurrence of unfilled areas due to insufficient liquid crystal droplet Defective phenomenon, can prevent the damage caused by the pressure on the color filter, and can overcome the thickness deviation caused by the process, and because the ions and impurities will not dissolve into the liquid crystal, it will not reduce the voltage retention rate, and will not occur when the liquid crystal is aligned. At the same time, it is possible to form a spacer with excellent rubbing resistance, sufficient voltage retention and liquid crystal orientation, and excellent image development, high sensitivity, thermal stability, dimensional stability, and compressive strength. Background technique [0002] In liquid crystal panels and touch panels, spacer particles ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G02F1/13G02F1/1335
CPCG03F7/0007G03F7/004G03F7/027G03F7/028G03F7/031G03F7/032G03F7/033
Inventor 郑泽晟赵显一李仁喆朴京夏白圣勇朴赞硕
Owner DONGJIN SEMICHEM CO LTD
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