Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Electrostatic absorption electrode and treating apparatus

An electrostatic adsorption and electrode technology, which is applied in the direction of holding devices, circuits, and discharge tubes that apply electrostatic attraction, can solve problems such as difficult repairs inside holes and reduced insulation, achieve low-cost repairs, prevent abnormal discharges, and improve The effect of conductivity

Inactive Publication Date: 2006-11-29
TOKYO ELECTRON LTD
View PDF2 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Also, when an abnormal discharge occurs in the gas flow path of the electrostatic adsorption electrode and when the anti-corrosion aluminum is consumed a little at a time during use, and the insulation is lowered, there is a possibility that the repair of the inside of the cavity is actually difficult, so it is necessary to replace the entire Problems like electrostatic adsorption electrodes

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electrostatic absorption electrode and treating apparatus
  • Electrostatic absorption electrode and treating apparatus
  • Electrostatic absorption electrode and treating apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

[0026] figure 1 It is a sectional view showing a plasma etching apparatus as an example of a processing apparatus equipped with an electrostatic chuck as an electrostatic adsorption electrode according to an embodiment of the present invention. Such as figure 1 As shown, the plasma etching apparatus 1 is configured as a capacitively coupled parallel plate plasma etching apparatus for etching a substrate G such as a glass substrate for an FPD that is a rectangular object to be processed. Here, as the FPD, liquid crystal display (LCD), light emitting diode (LED) display, electroluminescence (Electro Luminescence; EL) display, fluorescent display tube (Vacuum Fluorescent Display; VFD (vacuum fluorescent display)), plasma Display panel (PDP), etc. In addition, the processing apparatus of this invention is not limited only to a plasma etching appara...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides preventing abnormal discharge in gas flow circuit of electrostatic absorption electrode, and even if occurring abnormal discharge in gas flow circuit, the electrostatic absorption electrode can be easily repaired. The electrostatic sucker (5) is a composite construction which having the first substrate material (30) and the second substrate material (31) that can separate one another. Embedding electrode (6b) in dielectric materials film (8) of the second substrate material (31). In the state of combining the first substrate material (30) and the second substrate material (31), forming clearance tween in the manner of enveloping the first substrate material (30) surrounding, the clearance supplying gas to gap (9c) by the way of supplying heat-transfer gas.

Description

technical field [0001] The present invention relates to an electrostatic adsorption electrode and a processing device. Specifically, it relates to an electrostatic adsorption electrode for placing a substrate such as a glass substrate in a manufacturing process of a flat panel display (FPD) or the like, and a processing device equipped with the electrostatic adsorption electrode. . Background technique [0002] In the manufacturing process of the FPD, plasma processing such as dry etching, sputtering, and CVD (Chemical Vapor Deposition) is performed on a glass substrate as an object to be processed. For example, a pair of parallel plate electrodes (upper and lower electrodes) are arranged in a chamber, a glass substrate is placed on a holder (substrate mounting table) functioning as a lower electrode, a processing gas is introduced into the chamber, and at least High-frequency power is applied to one electrode, a high-frequency electric field is formed between the electrode...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/683
CPCH01J37/32724H01L21/3065H01L21/6833H02N13/00
Inventor 林圣南雅人
Owner TOKYO ELECTRON LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com