Process of preparing single-layer nanometer TiO2 rod film in pure rutile structure
A technology of titanium dioxide and nanorods, which is applied in the field of preparing pure rutile structure titanium dioxide nanorod single-layer films, can solve problems such as difficulties, and achieve the effect of simple method, uniformity and good repeatability of pure rutile structure titanium dioxide nanorod single-layer films
Image
Examples
Embodiment 1
[0027] 1) Preparation of pickling solution
[0028] The hydrofluoric acid with a mass concentration of 55%, nitric acid with a mass concentration of 65% and deionized water are mixed in a volume ratio of 1:3:6 to obtain an acid lotion.
[0029] 2) Prepare reaction solution A
[0030] Add 1.0 ml of nitric acid with a mass concentration of 63% and 100 mg of hexamethine (mass percentage purity> 99.5%) to 50 ml of a 30% hydrogen peroxide solution in order to obtain a reaction solution A.
[0031] 3) Prepare reaction solution B
[0032] The size is 5×5×0.01 (cm 3 ) The surface of the titanium metal plate is pickled with the pickling solution obtained in step 1) at a temperature of 60° C., and then cleaned with deionized water in ultrasonic waves.
[0033] The cleaned titanium metal plate was immersed in 50 ml of reaction solution A, and reacted at 80° C. for 52 hours to obtain the remaining reaction solution, that is, reaction solution B.
[0034] 4) Preparation of titanium substrate
...
Embodiment 2
[0042] 1) Preparation of pickling solution
[0043] The same as in Example 1.
[0044] 2) Prepare reaction solution A
[0045] The same as in Example 1.
[0046] 3) Prepare reaction solution B
[0047] The surface cleaning of the titanium metal plate is the same as in Example 1; the cleaned titanium metal plate is immersed in 50 ml of reaction solution A and reacted at 80° C. for 56 hours to obtain the remaining reaction solution, namely, reaction solution B.
[0048] 4) Preparation of titanium substrate
[0049] The same as in Example 1.
[0050] 5) Reaction
[0051] The above-mentioned titanium substrate was immersed in the reaction solution B and reacted at 80° C. for 16 hours. The titanium substrate after the reaction was rinsed with deionized water and dried.
[0052] Reaction result
[0053] After the reaction, the surface of the titanium substrate was uniformly bright green, and the formation of Figure 4 As shown in the single-layer nanorod film, the thickness of the film ...
Embodiment 3
[0055] 1) Preparation of pickling solution
[0056] Mixing hydrofluoric acid with a mass percentage concentration of 50%, nitric acid with a mass percentage concentration of 68% and deionized water in a volume ratio of 1:4:7 to obtain an acid lotion.
[0057] 2) Prepare reaction solution A
[0058] 0.5 ml of nitric acid with a mass concentration of 63% and 70 mg of hexamethine (mass percentage purity>99.5%) were sequentially added to 50 ml of a 30% hydrogen peroxide solution to obtain a reaction solution A.
[0059] 3) Prepare reaction solution B
[0060] The size is 5×5×0.01 (cm 3 ) The surface of the titanium metal plate is pickled with the pickling solution obtained in step 1) at a temperature of 60° C., and then cleaned with deionized water in ultrasonic waves.
[0061] The cleaned titanium metal plate was immersed in 50 ml of reaction solution A, and reacted at 60° C. for 48 hours to obtain the remaining reaction solution, that is, reaction solution B.
[0062] 4) Preparation...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Thickness | aaaaa | aaaaa |
| Thickness | aaaaa | aaaaa |
| Diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- IPC
- C23C22/05; C23G1/10; C23G5/00; B08B3/12
- Inventors
- 吴进明