Process for preparing TiO2 nanocrystal porous film electrode by low-temp. electrophoresis sedimentation
A technology of titanium dioxide and electrophoretic deposition, which is applied in electrophoretic plating, circuits, electrolytic coatings, etc., can solve problems that affect the stability and repeatability of nanocrystalline porous thin film electrodes, electrodes destroy flexible conductive materials, and flexible conductive materials are not resistant to high temperatures. , to achieve the effect of uniform and controllable deposition film thickness, fast film formation and low cost
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[0030] Example 1
[0031] (1) Weigh 0.5g TiO 2 The particles (P25) are put in 10ml n-butanol solution and mixed and stirred for 2 hours and then dispersed by ultrasonic for 30 minutes to make TiO 2 colloid.
[0032] (2) Use two pieces of fluorine-doped SnO 2 Conductive glass (FTO) (Heilongjiang Haake New Energy Co., Ltd., sheet resistance 30Ωcm -2 ) As the electrode substrate, TiO is placed in parallel on the conductive surface 2 In the colloidal solution, the distance is 1cm, and the electrophoretic deposition is 30s. Take out the glass electrode connected to the negative electrode of the power supply, and the deposition film can be seen. Rinse the adhesive liquid on the film with n-butanol solution to obtain TiO 2 Thin film electrode.
[0033] (3) The prepared TiO 2 The thin-film electrode is naturally dried and sintered at a high temperature of 450°C for 30 minutes to obtain the TiO of the present invention 2 Nanocrystalline porous film electrode.
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[0034] Example 2
[0035] In addition to the TiO in step (1) 2 Except that the particle weight is changed to 0.4g, the other steps and process conditions are the same as in Example 1, to obtain the TiO of the present invention 2 Nanocrystalline porous film electrode.
Example Embodiment
[0036] Example 3
[0037] In addition to the TiO in step (1) 2 Except that the weight of the particles is changed to 0.3g, the other steps and process conditions are the same as in Example 1, to obtain the TiO of the present invention 2 Nanocrystalline porous film electrode.
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