Sputtering target, optical information recording medium and method for producing same
A recording medium and a manufacturing method technology, applied in the field of sputtering targets, can solve the problems of poor optical properties and amorphous properties, and achieve the effects of improving transmittance, improving repetitive rewriting properties, and excellent mechanical properties
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Embodiment 1-4
[0046] Prepare SiO with a thickness of 5 μm or less equivalent to 4N 2 Powder, Y 2 o 3 Powder and Al 2 o 3 The powder was blended according to the composition shown in Table 1, mixed by a wet method, dried, and then calcined at 1100°C. Then, the calcined powder is finely pulverized by wet method to an average particle diameter of about 1 μm, and then a binder is added and granulated by a spray dryer. The granulated powder is then cold-pressed, sintered under normal pressure at 1200-1600°C in an oxygen environment (flowing), and finally the sintered material is machined into the shape of the target.
[0047] The sintering temperatures of Examples 1 to 4 were 1400°C, 1550°C, 1250°C, and 1400°C, respectively. In addition, as long as the sintering temperature is within the above-mentioned temperature range, sintering can be performed almost equally.
[0048] Table 1
[0049] example
composition
Y 2 o 3 :Al 2 o 3 : SiO 2
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