Plasma CVD apparatus and plasma surface treatment method

a plasma surface treatment and plasma technology, applied in the direction of coatings, electric discharge tubes, metal material coating processes, etc., can solve the problems of easy drastic change of temperature of the substrate surface, only moderate change of film quality, etc., and achieve the effect of lowering the temperature of the process targ
US20070074664A1Inactive Publication Date: 2007-04-05KOICHI IND PROMOTION CENT +1

Patent Information

Authority / Receiving Office
US · United States
Current Assignee / Owner
KOICHI IND PROMOTION CENT
Publication Date
2007-04-05
Estimated Expiration
Not applicable · inactive patent

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Abstract

A substrate is mounted on a mount surface of an anode in a chamber. A flow path is formed in a cathode facing the anode, and cooling water is circulated therethrough. A voltage is applied across the anode and the cathode to form a layer of carbon nanowall on the substrate by plasma, and thereafter the anode is cooled by a cooling member to rapidly cool the substrate to a predetermined temperature.
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Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a plasma CVD apparatus and a plasma surface treatment method.

[0003] 2. Description of the Related Art

[0004] As film forming techniques utilizing direct-current plasma, there are a diamond-like carbon film stack and its manufacturing method, which are described in Unexamined Japanese Patent Application KOKAI Publication No. 2003-113470.

[0005] The diamond-like carbon film stack described in the above-indicated publication is used as a field emission electrode, and includes graphite-like carbon lower layers having a high sp2 content and diamond-like carbon upper layers having a high sp3 content, which are sequentially stacked on a substrate in this order. According to this manufacturing method, the film thickness of each layer is set by changing the bias to be applied to a negative electrode (cathode). SUMMARY OF THE INVENTION

[0006] However, according to the manufacturing method of ...

Claims

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