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Graded topcoat materials for immersion lithography

a topcoat and immersion lithography technology, applied in the field of immersion photolithography, can solve the problems of adverse effects on the exposure system, limited the performance of topcoat materials, and adverse effects on the photoresis

Inactive Publication Date: 2008-12-18
IBM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0003]A first aspect of the present invention is a composition of matter, comprising: a mixture of a first polymer and a second polymer, the first polymer containing fluorine, the second polymer miscible with the first polymer, the second polymer different fr

Problems solved by technology

Immersion fluids can have adverse effects on the photoresist by extracting key components the photoresist such as sensitizers and photoacid generators and can have adverse effects on the exposure system such as clouding the immersed lens by depositing extracted photoresist materials on the lens.
The requirement to optimize the topcoat interaction at both interfaces has limited the performance of topcoat materials, particularly in terms of increasing the receding contact angle (and thereby increasing maximum wafer scan rates).

Method used

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  • Graded topcoat materials for immersion lithography
  • Graded topcoat materials for immersion lithography
  • Graded topcoat materials for immersion lithography

Examples

Experimental program
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examples

[0047]A representative polymerization procedure for the Class A and Class B polymers is as follows: to a 100 mL round-bottom flask, monomer (1 equiv.), 2,2′-azobis(2-methylpropionitrile) (AIBN) (0.04 equiv.), 1-dodecanethiol (0.03 equiv.) were added. Anhydrous, inhibitor-free tetrahydrofuran was added to afford about 25 percent by weight solids solution. A reflux condenser with a rubber septum was added and the oxygen was removed from the solution by three sequential pump-backfill cycles using nitrogen and vigorous stirring. The reaction was heated to reflux overnight. The reaction mixture was concentrated under vacuum and a small amount of acetone was added. The polymer solution was precipitated into a non-solvent (typically, hexane or methanol). The polymer was isolated and washed with excess non-solvent using a glass-fritted filter. The polymer was dried under vacuum overnight between 60° C. to 80° C., after which time, it was allowed to cool to room temperature under vacuum. In ...

example polymer structures

[0048]Examples 1 through 17 are class A polymers and examples 18 through 48 are class B polymers.

example 1

Poly(1,1,1-trifluoro-2-(trifluoromethyl)-pentan-2-ol-4-yl methacrylate) (iPrHFAMA) Comprises Repeat Units Having the Structure

[0049]

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Abstract

A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.

Description

FIELD OF THE INVENTION[0001]The present invention relates to the field of immersion photolithography; more specifically, it relates to topcoat compositions for immersion lithography.BACKGROUND OF THE INVENTION[0002]In immersion lithography, an immersion fluid having a refractive index higher than air is placed between the final lens element or window of the exposure system and the photoresist layer to be exposed. This affords higher numerical aperture imaging systems and increases the depth of focus so smaller features may be imaged with good process latitude. Immersion fluids can have adverse effects on the photoresist by extracting key components the photoresist such as sensitizers and photoacid generators and can have adverse effects on the exposure system such as clouding the immersed lens by depositing extracted photoresist materials on the lens. To overcome these problems, topcoats are used to coat the photoresist and protect the photoresist from the immersion fluid. Topcoat m...

Claims

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Application Information

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IPC IPC(8): G03C1/79G03C5/305
CPCG03F7/11G03F7/2041Y10S438/952
Inventor ALLEN, ROBERT D.BROCK, PHILLIPSANDERS, DANIEL P.SUNDBERG, LINDA K.
Owner IBM CORP
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