Plasma texturing reaction apparatus

a technology of plasma ions and reaction apparatuses, which is applied in the direction of electrical apparatus, basic electric elements, electric discharge tubes, etc., can solve the problems of reducing efficiency, difficult to apply surface texturing to ultrathin wafers, and difficulty in independently adjusting ion energy reaching the surface of wafers, etc., to achieve appropriate control of ion energy and increase the density and uniformity of plasma ions

Inactive Publication Date: 2012-03-15
SEMIMATERIALS
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Benefits of technology

[0011]Accordingly, the present invention has been made in an effort to solve the problems occurring in the related art, and an object of the present invention is to increase the density and uniformity of plasma ions and appropriately control ion energy by using a square induction coil when conducting plasma texturing through dry etching on a solar cell wafer.
[0012]In order to achieve the above object, according to one aspect of the present invention, there is provided a plasma texturing reaction apparatu...

Problems solved by technology

As a consequence, it is difficult to apply the surface texturing to an ultrathin wafer.
According to the solenoid type plasma reaction apparatus, since an inductance value is relatively high and a sputtering problem due to a high voltage occurs, efficiency may be reduced.
According to the planar type plasma reaction apparatus, since the distance between a plasma source and a wafer is short, it may be difficul...

Method used

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Embodiment Construction

[0022]Reference will now be made in greater detail to a preferred embodiment of the present invention, an example of which is illustrated in the accompanying drawings.

[0023]FIG. 1 is a block diagram illustrating a plasma texturing reaction apparatus in accordance with an embodiment of the present invention. Referring to FIG. 1, the plasma texturing reaction apparatus includes a chamber 103, a polygonal induction coil 104, a high frequency low power supply unit 108, and a high frequency source power supply unit 111. The chamber 103 includes a dielectric window 103A and a chamber body 103B and receives a solar cell wafer 102 to be textured. The polygonal induction coil 104 is provided at an outer upper portion of the dielectric window 103A to generate a magnetic field for generating plasma. The high frequency low power supply unit 108 supplies a cathode 101 of the chamber 103 with high frequency power corresponding to process conditions. The high frequency source power supply unit 111...

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Abstract

A plasma texturing reaction apparatus includes a chamber including a dielectric window and a chamber body and receiving a solar cell wafer to be textured, and a polygonal induction coil provided at an outer upper portion of the dielectric window to generate a magnetic field for generating plasma, a high frequency low power supply unit that supplies a cathode of the chamber with high frequency power corresponding to process conditions, and a high frequency source power supply unit that supplies the polygonal induction coil with high frequency power.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a plasma texturing technology for a solar cell, and more particularly, to a plasma texturing reaction apparatus which can improve the manufacturing efficiency and quality of a solar cell by increasing the density and uniformity of plasma ions and appropriately controlling ion energy when conducting plasma texturing through dry etching on a solar cell wafer to increase a light absorption amount of available light to the inside of the solar cell by reducing a light reflection amount on the surface of the solar cell.[0003]2. Description of the Related Art[0004]A solar cell is a photoelectric element which converts light energy into electrical energy. The solar cell is considered as a clean energy source which can overcome problems such as environmental pollution, high fuel cost, etc. caused by the use of fossil fuel energy.[0005]Recently, research has been actively conducted to improve the ...

Claims

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Application Information

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IPC IPC(8): C23F1/08
CPCH01J37/32165H01J37/3211
Inventor PARK, KUN- JOOKIM, GI-HONG
Owner SEMIMATERIALS
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