Apparatus and method for the synthesis and treatment of metal monolayer electrocatalyst particles in batch or continuous fashion
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example 1
[0067]The present invention may be illustrated by way of exemplary embodiments. In this example, the deposition process will be described with reference to deposition onto non-noble metal-noble metal core-shell nanoparticles. The core-shell nanoparticles may be initially formed using any method known in the art including, for example, those disclosed in U.S. patent application Ser. No. 12 / 709,910. The deposition process in Example 1 will now be described using FIGS. 2 and 3 as a reference. The nanoparticle surface in FIG. 2 shows a portion of the non-noble metal core (1) along with the noble metal shell (2). Non-noble metal ions (4) are initially adsorbed on the surface by immersing the nanoparticles in a cell (10) comprising the appropriate concentration of non-noble metal ions (4) in step S1. The non-noble metal ions (4) are contained in solution within the slurry (14) illustrated in FIG. 1. Typical non-noble metal ions that may be used for UPD of an initial adlayer include, but a...
example 2
[0072]A second exemplary embodiment of the present invention will now be described in detail with reference to FIG. 4 which shows the overall process flow for film growth by UPD and galvanic displacement using a rotating cylinder slurry cell. Initially, in step S10, particles of the desired composition, size, and shape are formed. Such particles may also be purchased from commercial vendors, such as E-TEK (39 Veronica Av., Somerset, N.J., 08873) and BASF (Germany). The particles used may be of any type onto which atomic layers of the desired material may be deposited. In a preferred embodiment the particles are of the type described in Section I above. Prior to deposition of an initial adlayer by UPD, it is necessary to prepare a slurry comprising the particles and ions of the desired UPD element as shown in step S11. The UPD element must be a material which exhibits underpotential deposition such as, for example, any of Cu, Pb, Bi, Sn, Ce, Ag, Sb, and Tl.
[0073]In step S12 the elect...
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