Methods for increasing the refractive index of high-index nanoimprint lithography films

Abstract

Embodiments of the present disclosure generally relate to optically densified nanoimprint films and processes for making these optically densified nanoimprint films, as well as optical devices containing the optically densified nanoimprint films. In one or more embodiments, a method of forming a nanoimprint film includes positioning a substrate containing a porous nanoimprint film within a processing chamber, where the porous nanoimprint film contains nanoparticles and voids between the nanoparticles, and the porous nanoimprint film has a refractive index of less than 2. The method also includes depositing a metal oxide on the porous nanoimprint film and within at least a portion of the voids to produce an optically densified nanoimprint film during an atomic layer deposition (ALD) process.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application claims benefit to U.S. Prov. Appl. No. 63 / 012,688, filed on Apr. 20, 2020, and U.S. Prov. Appl. No. 63 / 012,691, filed on Apr. 20, 2020, which are herein incorporated by reference.BACKGROUNDField[0002]Embodiments of the present disclosure generally relate to micro-device processing, and more specifically to nanoimprint lithography (NIL) films and processes to make the same.Description of the Related Art[0003]Nano and micro-patterning of nanoparticle imprint provides opportunities for developing nanomaterial-based optics, electronics, displays, energy devices, sensors, and other types of devices with nanometer scale resolution. The imprint materials currently available contain either organic (high index polymers) or inorganic-organic hybrid materials (sol-gel). The majority of the imprint materials have low refractive index (<1.7), along with multiple problems associated with optical transparency in visible region, optic...

AI Technical Summary

Benefits of technology

This patent discloses a way to make films that are densified and optically dense (e.g. have a high refractive index and hardness) for use in nanoimprint lithography. The method involves creating a base film with nanoparticles and voids between them, and then adding a metal oxide to increase the refractive index of the film. The resulting film has high refractive index, hardness, yield strength, and etch resistance. This method also reduces the likelihood of the film getting bent or deformed during processing.

Problems solved by technology

The majority of the imprint materials have low refractive index (<1.7), along with multiple problems associated with optical transparency in visible region, optical resolution, processability, high shrinkage of imprinted features and cost effectiveness.

Images