The invention relates to a method for replicating a hologram in a replication
assembly with an
exposure module. The
exposure module comprises at least one
light source and a master element comprising a master hologram to be replicated, and is configured to bring the replication
assembly into optical contact with the master element. The at least one
light source illuminates the master hologram onto a region of the replication
assembly to obtain a replicated hologram. The method includes providing a beam-shaping unit, adjusting the intensity distribution of a
light wave with which the beam-shaping unit is irradiated, and generating a free-form wave with a spatially varying
angular distribution by means of the beam-shaping unit, wherein the
angular distribution is determined by the intensity distribution of the
light wave.The invention further relates to a method for determining an intensity distribution of a
light wave, an intensity-modulating unit for the
exposure of a master hologram with a desired free-form wave and its use for the replication of a master hologram in a replication network.