Chromium-doped non-crystalline graphite ware reducing coating layer and preparation process thereof
An amorphous, coating technology, applied in chemical instruments and methods, coatings, layered products, etc., can solve problems such as low hardness, and achieve the effect of uniform thickness and high bonding strength
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Embodiment 1
[0023] After cleaning and drying the workpiece, put it into the vacuum chamber of the 4-target magnetron sputtering ion plating equipment, and evacuate to 3.3×10 -3 Pa, into the argon, the flow: 10sccm. Perform ion bombardment cleaning for 20 minutes, adjust the negative bias value to -400V, turn on two pure chromium metal targets, and the target current range is 0.5A. Carry out the coating process, adjust the negative bias voltage to -80V, and turn on 4 metal targets at the same time: 2 pure graphite targets and 2 pure chromium metal targets, among which the target current of graphite is 1.65A, and the target current of chromium is 0.2 A, the time is 150 minutes. The coating obtained by the process is an amorphous graphite coating containing 4.6% (mass percentage) of metallic chromium, the coating has a hardness of 2050HV, a coefficient of friction of 0.09, and a thickness of 1.2 μm.
Embodiment 2
[0025] After cleaning and drying the workpiece, put it into the vacuum chamber of the 4-target magnetron sputtering ion plating equipment, and evacuate to 3.9×10 -3 Pa, into the argon, the flow: 12sccm. Perform ion bombardment cleaning for 15 minutes, adjust the negative bias value to -300V, turn on two pure chromium metal targets, and the target current range is 0.4A. Carry out the coating process, adjust the negative bias voltage to -75V, and turn on 4 metal targets at the same time: 2 pure graphite targets and 2 pure chromium metal targets, among which the target current of graphite is 2.5A, and the target current of chromium is 0.3 A, the time is 120 minutes. The coating obtained by the process is an amorphous graphite coating containing 3.0% (mass percentage), the hardness of the coating is 1650HV, the coefficient of friction is 0.11, and the thickness is 1.1 μm.
Embodiment 3
[0027] After cleaning and drying the workpiece, put it into the vacuum chamber of the 4-target magnetron sputtering ion plating equipment, and evacuate to 5.3×10 -3 Pa, into the argon, the flow: 12sccm. Perform ion bombardment cleaning for 30 minutes, adjust the negative bias value to -350V, turn on two pure chromium metal targets, and the target current range is 0.4A. Carry out the coating process, adjust the negative bias to -65V, and turn on 4 metal targets at the same time: 2 pure graphite targets and 2 pure chromium metal targets, among which the target current of graphite is 2.0A, and the target current of chromium is 0.15 A, the time is 180 minutes. The coating obtained by this process is an amorphous graphite coating containing 6.3% (mass percent) metallic chromium, the coating has a hardness of 1950HV, a coefficient of friction of 0.08, and a thickness of 1.5 μm.
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