Process for fabricating a monolayer or multilayer metal structure in LIGA technology, and structure obtained

A structure and metal technology, which is applied in the field of new single-layer or multi-layer metal structures, can solve the problem of no forming components, and achieve the effect of good thickness control and quality improvement.

Active Publication Date: 2007-09-19
ROLEX SA
View PDF5 Cites 43 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These documents do not propose to use the substrate as a shaped element of at least one surface

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Process for fabricating a monolayer or multilayer metal structure in LIGA technology, and structure obtained
  • Process for fabricating a monolayer or multilayer metal structure in LIGA technology, and structure obtained
  • Process for fabricating a monolayer or multilayer metal structure in LIGA technology, and structure obtained

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0112] Embodiment 1: Manufacture of return spring

[0113] FIG. 1 shows a return spring with a top face 2 , a bottom face 1 , a cylindrical hole 3 and a beveled part 4 .

[0114] FIG. 2A shows the structure obtained after step b) of the method of claim 2 , said structure comprising a photoresist layer 6 covering the substrate 5 . This structure was obtained using the protocol described below.

[0115] A substrate 5 formed from a 1 mm thick and 150 mm diameter stainless steel plate was degreased and prepared for electroforming by degreasing with an alkaline solution, neutralizing with an acid solution to passivate its surface, and then rinsing with distilled water and dry. Next, a first layer of negative photoresist based on an octafunctional epoxy resin SU-8-2035 (Shell Chemical) with a thickness of 100 μm was deposited on the substrate 5 by spin coating, followed by heating at 65° C. minutes, and then heated at 95 °C for 20 minutes to evaporate the solvent. Next, a second...

Embodiment 2

[0122] Example 2: Manufacture of an escapement support for a watch movement

[0123] 3A and 3B show a support comprising a top surface 1 , a bottom surface 2 , a cylindrical hole 3 , a prong 4 and a notch 5 .

[0124] FIG. 4A shows the structure obtained after step b) of the method, said structure comprising a photoresist layer 7 covering the substrate 6 . This structure was obtained using the protocol described below.

[0125]A substrate 6 formed from a stainless steel plate 1 mm thick and 150 mm in diameter was degreased and prepared for electroforming by degreasing with an alkaline solution, neutralizing with an acid solution to passivate its surface, and then rinsing with distilled water , and dry. Next, a first layer of negative photoresist based on an octafunctional epoxy resin SU-8-2035 (Shell Chemical) with a thickness of 70 μm was deposited on the substrate 5 by spin coating, followed by heating at 65° C. for 3 minutes, followed by heating at 95°C for 9 minutes to ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to a process for fabricating a monolayer or multilayer metal structure in LIGA technology, in which a photoresist layer is deposited on a flat metal substrate, a photoresist mold is created by irradiation or electron or ion bombardment, a metal or alloy is electroplated in this mold, the electroformed metal structure is detached from the substrate and the photoresist is separated from this metal structure, wherein the metal substrate is used as an agent involved in the forming of at least one surface of the metal structure other than that formed by the plane surface of the substrate.

Description

technical field [0001] The present invention relates to a method for manufacturing single-layer or multilayer structures by the LIGA process, and to new single-layer or multilayer metal structures obtainable by this method. Background technique [0002] DGC Mitteilungen No.104, 2005 mentions that the high-precision metal parts used to manufacture chronographs, such as anchors or escape wheels, are called LIGA (Lithographie GalvanikAbformung [Lithography, Electroforming, Molding], produced by Karlsruhe, Germany. The method designed by W.Ehrfeld of the Center for Nuclear Research in Erwin) the use of the process. This method has the disadvantage of requiring expensive equipment, a synchrotron, to produce X-ray irradiation. Therefore it cannot be widely used in watchmaking. [0003] A.B. Frazier et al., Journal of Microelectromechanical Systems, 2, 2, June 1993 describe the fabrication of metal structures by electrodeposition of metals in molds made of polyimide-based photore...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/16G03F7/20G03F7/26C25D5/02G04B1/14G04B33/00
CPCB81C99/0085C25D1/20C25D1/00G03F7/00C25D1/003B81B2201/035B81C2201/032
Inventor C·绍奇
Owner ROLEX SA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap