Substrate processing apparatus

A substrate processing device and technology for substrates, which are applied in the fields of components, optics, and instruments for opto-mechanical processing, can solve the problems of prolonged drying time and reduced drying performance.

Active Publication Date: 2007-10-03
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, when the substrate processing apparatus of Patent Document 1 is used, the drying time becomes longer and the drying performance deteriorates.

Method used

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Embodiment Construction

[0019] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

[0020]

[0021] FIG. 1 is a perspective view showing an example of the overall structure of a wet bench 1 in an embodiment of the present invention. This wet bench 1 is a "batch type" substrate processing apparatus that processes a plurality of substrates W at a time. A cleaning process and a drying process are performed on a plurality of (for example, 26) substrates W accommodated in the cassette C using a chemical solution and pure water.

[0022] As shown in FIG. 1 , the wet bench 1 mainly includes a stacking unit 2 , a take-out unit 3 , processing units 4 to 9 , a decompression drying unit 10 , and a transfer robot 11 . Here, as shown in FIG. 1 , in this embodiment, the stacking unit 2 , the take-out unit 3 , the processing units 4 to 9 , and the reduced-pressure drying unit 10 are linearly arranged along the predetermined processing unit array directio...

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Abstract

A discharge pipe is provided within a processing chamber, and ejects a drying gas. A pressure reducing pump exhausts air from the processing chamber to create a reduced-pressure atmosphere in the processing chamber. A drying gas supply passage supplies the drying gas generated in a first drying gas generator and in a second drying gas generator to the discharge pipe. The first drying gas generator generates the drying gas by bubbling IPA liquid stored in a heating bath with nitrogen gas. The second drying gas generator generates the drying gas by mixing IPA vapor produced by evaporation in an IPA vapor generating bath and nitrogen gas together. Thus, the supply of the drying gas generated in the plurality of drying gas generators to the processing chamber increases the concentration of the IPA vapor within the processing chamber. This shortens the time required for drying to improve drying performance.

Description

technical field [0001] The present invention relates to a substrate processing device for processing semiconductor substrates, glass substrates for liquid crystal display devices, glass substrates for photomasks, substrates for optical discs, etc. Improvement of drying process performed on cleaned substrates. Background technique [0002] Conventionally, there is known a substrate processing apparatus (for example, Patent Document 1) in which, in the manufacturing process of a substrate, processing with a chemical solution such as hydrofluoric acid (HF) and cleaning with pure water are sequentially performed, followed by pure water The substrate is lifted out of water, and vapor of an organic solvent such as isopropyl alcohol (hereinafter referred to as "IPA") is supplied to the periphery of the substrate to dry the substrate. This substrate processing apparatus can efficiently dry the substrate by depressurizing the atmosphere in the processing chamber after substituting t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00H01L21/30H01L21/67H01L21/304G03F1/82
CPCH01L21/67028H01L21/67173H01L21/67034H01L21/304
Inventor 基村雅洋
Owner DAINIPPON SCREEN MTG CO LTD
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