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Method for producing micro-optical element by hot imprint technology

A micro-optical and hot embossing technology, applied in optical components, optics, opto-mechanical equipment, etc., to achieve the effects of low cost, good process realization, and high radiation damage resistance threshold

Inactive Publication Date: 2008-02-27
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] However, the application of nanoimprinting to produce micro-optical elements with multi-step or continuous relief structure features and materials made of quartz and single crystal silicon has not been reported.

Method used

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  • Method for producing micro-optical element by hot imprint technology
  • Method for producing micro-optical element by hot imprint technology
  • Method for producing micro-optical element by hot imprint technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] To make a binary optical lens with a multi-step relief structure, the element material and the stamper material are both quartz, and the polymer required for hot embossing is polymethyl methacrylate (PMMA). The specific process is as follows:

[0047] 1. According to the process flow shown in Figure 1, laser direct writing technology is used to make a surface relief stamper complementary to the target structure, as shown in Figure 2(a).

[0048] 2. Apply thermal embossing to reversely replicate the structure on the stamper to the PMMA on the substrate, as shown in Figure 2(b).

[0049] 3. Using the PMMA pattern as a mask, a reactive ion etching technique is used to obtain a multi-step relief structure on the quartz substrate, as shown in FIG. 2(c).

Embodiment 2

[0051] Fabricate a binary optical lens with a continuous relief structure as shown in Figure 3, the element material is quartz, the die material is single crystal silicon, and the polymer is aromatic ring polymer PPM. The specific process is as follows:

[0052] 1. According to the process flow shown in Figure 1, use the electron beam direct writing technique to make a continuous relief stamper with a complementary structure to the target, as shown in Figure 4(a).

[0053] 2. Apply thermal embossing to reversely copy the relief structure on the stamper to the PPM on the substrate, as shown in Figure 4(b).

[0054] 3. Using the PPM pattern as a mask, apply reactive ion etching technology to obtain a continuous relief structure on the quartz substrate, as shown in Figure 4(c).

Embodiment 3

[0056]Replicate the microlens array with a continuous relief structure as shown in Figure 5(a), the element material is glass, and the polymer is PMMA. First, the original microlens array is used as a stamper to obtain a transition piece with a complementary surface relief structure, which is made of quartz, as shown in Figure 6(a). Then the transition piece is used as a pressing mold to obtain a microlens array consistent with the relief structure of the original lens. The specific process is as follows:

[0057] 1. The first imprint

[0058] a) The relief structure of the original microlens array is reversely copied to the PMMA on the substrate by thermal embossing, as shown in Fig. 5(b).

[0059] b) Using the PMMA pattern as a mask, a continuous relief structure is obtained on the quartz substrate by applying reactive ion etching technology, as a transition piece for replication, as shown in Figure 5(c).

[0060] 2. The second imprint

[0061] c) Thermal embossing was u...

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Abstract

There is a sot of a method which uses the heat autogram technique to make the glimmer element, it relates to fabrication technique of the optical element. There is the glimmer element which has the character in that the multiple steps and the continuous embossment configuration by using this method, and this method has this four steps: (1)Using the minuteness machining technique to make the pressing mould which has the surface embossment configuration. (2)Using the heat autogram to make the embossment configuration of the pressing mould to be pressed to the polymer of the chip. (3)Using the reactive ion etching technique to obtain the embossment configuration in the chip by using the polymer configuration to be the mask. (4)Processing the step(1)-(3)once or repeating the step(1)-(3)basing the need of the fabrication until the glimmer element is achieved finally. This invention is characterized in that simple craftwork, high precision, quick speed, good repeatability, low charge, high productive rate, and so on.

Description

technical field [0001] The invention belongs to a manufacturing method of a micro-optical element, and relates to a method for manufacturing a micro-optical element with multi-step or continuous embossed structural features by using a thermal embossing technology. Background technique [0002] Micro-optical components have many excellent functions in realizing light wave conversion, which are difficult for traditional optics, and are conducive to promoting the miniaturization, arraying and integration of optical systems, opening up a new field of vision in the field of optics. [0003] There are many methods for making micro-optical elements, which can be divided into three methods according to the characteristics of the mask used and the relief structure of the processed surface. [0004] Firstly, the main manufacturing method for processing multi-level phase micro-optical elements is to form a step-relief surface through multiple overlays based on ultraviolet lithography t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G02B3/00G02B5/00G02B1/02
Inventor 金鹏高育龙刘楠谭久彬
Owner HARBIN INST OF TECH