Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High sensitivity nano biosensor production method

A biosensor and high-sensitivity technology, which is applied in the field of high-sensitivity nano-biosensor production, can solve the problems of low detection sensitivity and achieve the effect of improving detection sensitivity and enhancing strength

Inactive Publication Date: 2008-03-19
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF0 Cites 23 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The problem to be solved by the present invention is to provide a high-sensitivity nano-biosensor manufacturing method for the problem of low detection sensitivity of existing biosensors

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High sensitivity nano biosensor production method
  • High sensitivity nano biosensor production method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The specific process of embodiment 1 of the present invention is:

[0032] (1) Utilize the extended nanosphere imprinting (NSL) technology developed in our laboratory to fabricate a diamond-shaped silver nanoarray with an array period of 440nm, a metal silver surface inner width of 140nm, and a surface outer height of 47nm on a K9 glass substrate. The cross-sectional view is as follows As shown in Figure 1;

[0033] The fabrication method of rhombus structure array is as follows:

[0034] (a) Blow dry with nitrogen after thoroughly cleaning the substrate;

[0035] (b) two kinds of monodisperse nanospheres with a diameter of about 440nm and about 200nm are mixed evenly and then added dropwise on the surface of the substrate to realize self-assembly;

[0036] (c) Reactive ion etching (RIE) technology is used to etch the self-assembled monolayer of nanospheres, and the 200nm nanospheres are completely etched away;

[0037] (d) Deposit thickness is the metal silver of ab...

Embodiment 2

[0046] The specific process of embodiment 2 of the present invention is:

[0047] (1) Utilize the extended nanosphere imprinting (NSL) technology developed in our laboratory to fabricate a diamond-shaped silver nanoarray with an array period of 400nm, a metal silver surface inner width of 110nm, and a surface outer height of 50nm on a quartz glass substrate. The cross-sectional view is as follows As shown in Figure 1;

[0048] The fabrication method of rhombus structure array is as follows:

[0049] (a) Blow dry with nitrogen after thoroughly cleaning the substrate;

[0050] (b) two kinds of monodisperse nanospheres with a diameter of about 400nm and about 180nm are mixed evenly and then added dropwise on the surface of the quartz substrate to realize self-assembly;

[0051] (c) Reactive ion etching (RIE) technology is used to etch the self-assembled monolayer of nanospheres, and the 180nm nanospheres are completely etched away;

[0052] (d) Deposit thickness is the metal s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Widthaaaaaaaaaa
Heightaaaaaaaaaa
Diameteraaaaaaaaaa
Login to View More

Abstract

The present invention provides a producing method of the nanometer biosensor with high sensitivity. The procedures are as follows: firstly, selecting the fundus material and completing the producing of the metal nanometer array; secondly, soaking the fundus in the prepared biology activated chemical reagent solution to ensure the metal surface possess an activated group corresponding to the biology molecule, and to ensure the combination of the antigen and the silver granules array to be more easy, the biology activated chemical reagent is the octane mercaptan 1-OT and the eleven alcoholic acid 11-MUA with the hydrogen thiocyanato, the solvent is ethanol; thirdly, taking out the soaked substrate, cleaning off the leftover on the surface of the substrate and blow the substrate dry; fourthly, selecting the antigen corresponding to the detected molecule and the zero-distance coupling reagent; fifthly, mixing the antigen solution and the zero-distance coupling reagent solution, and then drip the mixed solution on the surface of the substrate for coupling reaction, and the reaction period is more than 3 hours; sixthly, rinsing the substrate and removing the leftover on the surface of the substrate and blow the substrate dry, and then the producing of the nanometer sensor is completed. The present invention improves greatly the sensitivity of the sensor.

Description

technical field [0001] The invention relates to a method for manufacturing biomolecules of an LSPR nanometer sensor, in particular to a method for manufacturing a high-sensitivity nanometer biosensor. Background technique [0002] LSPR (localized surface plasmon resonance) biosensor is favored by researchers for its convenience, high sensitivity, wide range of applications, real-time monitoring, etc., and is at the forefront of sensor research. It is considered the most It is a kind of potential biosensor, and the use of this new research method is of great significance to the basic research of life science, medical diagnosis and treatment. [0003] For the research on LSPR biosensors, Northwestern University in the United States has done a lot of representative work. It has done a considerable part of the preliminary experimental research work on the use of nanoparticles and structures for biomolecular markers and detection, using the truncated hexagonal distribution The t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01N33/48G01N21/55G01N21/552
Inventor 杜春雷朱少丽罗先刚杨欢邓启凌
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com