Film separation method for difluo-monochloromethane and trifluoromethane mixture

A technology of difluoromonochloromethane and trifluoromethane, which is applied in the production of chlorodifluoromethane, the disproportionation separation/purification of halogenated hydrocarbons, organic chemistry, etc. Waste of F22 products and other problems, to achieve the effect of safe and reliable use, small one-time investment, and less equipment
CN101239884AInactive Publication Date: 2008-08-13DALIAN UNIV OF TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
DALIAN UNIV OF TECH
Publication Date
2008-08-13
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a method for membrane separating gas mixture of difluo-monochloromethane and trifluoromethane, belonging to the fluorin-containing organic steam separation field. The gas mixture of difluo-monochloromethane and trifluoromethane, which is unseparated after condensation during producing refrigerants R22, passes through a gas membrane separation equipment under ambient temperature and pressure, difluo-monochloromethane first penetrates through a gas separation membrane to the other side, the gas mixture is divided into two section by the gas separation membrane, the collected difluo-monochloromethane penetration gas is compressed and reflowed into a refvigeratory-tower, difluo-monochloromethane is cooled, Liquefied and recoveried as the product, high-concentration trifluoromethane penetration gas can be directly sent to a torch to burn after standard-reach detection. The method has advantages of simple process, small device, convenient operation, high purity of obtained trifluoromethane, no secondary pollution, small investment, low operation cost and safe usage.
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Description

technical field

[0001] The invention relates to a membrane separation method for mixed gas of difluorochloromethane and trifluoromethane, which belongs to the field of separation of fluorine-containing organic vapors. In particular, it provides a method for separating a mixed system of difluorochloromethane (HCFC-22 or R22, F22) and trifluoromethane (HFC-23 or F23) by membrane separation technology. Background technique

[0002] Fluorine is the first element of the VII main group, with the largest electronegativity and small atomic radius. The van der Waals radius is 0.135nm, which is only slightly larger than the hydrogen atom's van der Waals radius of 0.12nm. Most of the hydrogen atoms in organic compounds can be replaced by fluorine atoms to form a large number of fluorine-containing organic compounds. Due to the high electronegativity of fluorine, small atomic radius, low polarizability of fluorine-carbon bond and weak intermolecular force, organic compounds are often a...

Claims

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