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Film separation method for difluo-monochloromethane and trifluoromethane mixture

A technology of difluoromonochloromethane and trifluoromethane, which is applied in the production of chlorodifluoromethane, the disproportionation separation/purification of halogenated hydrocarbons, organic chemistry, etc. Waste of F22 products and other problems, to achieve the effect of safe and reliable use, small one-time investment, and less equipment

Inactive Publication Date: 2008-08-13
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Incineration of the tail gas not only wastes F22 products, but also increases the incineration load. Moreover, if the F23 content of the tail gas does not meet the standard, it will not be able to obtain the economic benefits of the CMD project.

Method used

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  • Film separation method for difluo-monochloromethane and trifluoromethane mixture
  • Film separation method for difluo-monochloromethane and trifluoromethane mixture
  • Film separation method for difluo-monochloromethane and trifluoromethane mixture

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Embodiment Construction

[0029] As shown in Figure 1, the mixed gas of difluorochloromethane and trifluoromethane produced in industrial production first enters the condensation tower 10 through the production inlet pipeline 12, and then enters the condensation tower 11 through the condensation tower tail gas pipeline 13, and the liquefied two Chlorofluoromethane is discharged from the bottom of the condensation tower through the condensation recovery pipeline 15. The mixed gas of difluorochloromethane and trifluoromethane that has passed through the condensation tower 10 and the condensation tower 11 and has not been condensed is drawn out through the tail gas pipeline 14 of the condensation tower, and the solid impurities and liquid droplets are removed by the precision filter 16, and then passed through the tail gas inlet pipeline 1 It enters the gas membrane separation module 2 in gaseous state, the permeate gas is collected through the permeate gas pipeline 4 and then sent back to the condensation...

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Abstract

The invention discloses a method for membrane separating gas mixture of difluo-monochloromethane and trifluoromethane, belonging to the fluorin-containing organic steam separation field. The gas mixture of difluo-monochloromethane and trifluoromethane, which is unseparated after condensation during producing refrigerants R22, passes through a gas membrane separation equipment under ambient temperature and pressure, difluo-monochloromethane first penetrates through a gas separation membrane to the other side, the gas mixture is divided into two section by the gas separation membrane, the collected difluo-monochloromethane penetration gas is compressed and reflowed into a refvigeratory-tower, difluo-monochloromethane is cooled, Liquefied and recoveried as the product, high-concentration trifluoromethane penetration gas can be directly sent to a torch to burn after standard-reach detection. The method has advantages of simple process, small device, convenient operation, high purity of obtained trifluoromethane, no secondary pollution, small investment, low operation cost and safe usage.

Description

technical field [0001] The invention relates to a membrane separation method for mixed gas of difluorochloromethane and trifluoromethane, which belongs to the field of separation of fluorine-containing organic vapors. In particular, it provides a method for separating a mixed system of difluorochloromethane (HCFC-22 or R22, F22) and trifluoromethane (HFC-23 or F23) by membrane separation technology. Background technique [0002] Fluorine is the first element of the VII main group, with the largest electronegativity and small atomic radius. The van der Waals radius is 0.135nm, which is only slightly larger than the hydrogen atom's van der Waals radius of 0.12nm. Most of the hydrogen atoms in organic compounds can be replaced by fluorine atoms to form a large number of fluorine-containing organic compounds. Due to the high electronegativity of fluorine, small atomic radius, low polarizability of fluorine-carbon bond and weak intermolecular force, organic compounds are often a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C19/10C07C17/38
CPCY02P20/40
Inventor 贺高红王跃李保军杨建苏学峰吴梅红
Owner DALIAN UNIV OF TECH
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