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Preparation technique and device for ultra-pure hydrogen phosphide

A technology of hydrogen peroxide and process, which is applied in the field of producing ultra-high-purity hydrogen peroxide, can solve the problems that the quality cannot meet the use requirements, the product index of high-purity hydrogen peroxide is low, and the impurity content is low, and it achieves a small footprint, The effect of reducing content and easy automatic operation

Active Publication Date: 2012-01-04
JIANGYIN RUNMA ELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In order to overcome the defects of the ion resin exchange process in the prior art and the high-purity hydrogen peroxide product index is lower than the SEMI-C12 standard, and the quality cannot meet the deficiencies in use requirements, the purpose of the present invention is to provide a process with strong continuous and good separation effect Ultra-high-purity hydrogen peroxide purification production process with high purity and low impurity content and its device

Method used

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  • Preparation technique and device for ultra-pure hydrogen phosphide
  • Preparation technique and device for ultra-pure hydrogen phosphide

Examples

Experimental program
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Effect test

Embodiment 1

[0025] A process for the continuous production of ultra-high-purity hydrogen peroxide, first mixing industrial-grade hydrogen peroxide raw materials with modified activated carbon with a weight of 0.5% to 2% of hydrogen peroxide raw materials, and then operating under the operating pressure of 0.1 to 0.2MPa The filtrate is pumped into the multi-tower series rectification tower, and the metal ion complexing agent is added to the first-stage tower, and the semi-finished product out of the tower runs at 1.0-1.4MPa Reverse osmosis is carried out under pressure. After the reverse osmosis is completed, the ultra-high-purity hydrogen peroxide product is obtained by nanofiltration membrane filtration at an operating pressure of 0.5-0.8 MPa. In this embodiment, the amount of modified activated carbon is peroxide The weight of hydrogen raw material is 0.5%, 1% or 2%; the pressure selection for microfiltration membrane filtration or ultrafiltration membrane filtration is: 0.1, 0.15 or 0.2...

Embodiment 2

[0030] 35% (weight) in raw material tank 1, the technical grade hydrogen peroxide that contains impurity more is passed in the gac premixer 2, and the gac of modification adds by 1% of hydrogen peroxide treatment capacity, removes organic carbon here . The hydrogen peroxide with reduced organic carbon content is passed through the pipeline through the microfiltration ultrafiltration filter 3 (the pore size of the microfiltration membrane is 0.2-0.8 μm, the operating pressure is 0.1-0.2 MPa, the temperature is controlled at 20-25 ° C, the ultrafiltration membrane The pore size is 0.01-0.05μm, the operating pressure is 0.1-0.2MPa, and the temperature is controlled at 20-25°C), where macromolecular organic matter and small particle impurities are removed. The treated hydrogen peroxide is then input into the multi-tower series rectification column 4 with polymer metal ion complexing agent through the pump 8 made of oxidation-resistant and corrosion-resistant materials, where most ...

Embodiment 3

[0032] A device for implementing the above-mentioned continuous production of ultra-high-purity hydrogen peroxide, comprising a raw material tank 1, an activated carbon premixer 2, a microfiltration ultrafiltration filter 3, a multi-tower series rectification tower 4, and a reverse osmosis device 5 , nanofilter 6, finished product receiver 7, pump 8 and valve 9, the outlet of raw material tank 1 is connected with the inlet of activated carbon premixer 2, the outlet of activated carbon premixer 2 is connected with the inlet of microfiltration ultrafiltration filter 3, and the outlet of microfiltration ultrafiltration Filter 3 outlet and pump 8

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Abstract

The invention provides a continuous production process for ultra-pure hydrogen peroxide, comprising the following steps: mixing the industrial hydrogen peroxide material with the modified active carbon; then classifying filter by microfiltration membrane and ultrafiltration membrane in sequence; the filtrate is pumped into the distillation column formed by a plurality of columns connected in series; adding metal ion complexing agent into the primary column; performing reverse osmosis on the semi-finished products out of the column before filtering by nanofiltration membrane to get ultra-pure hydrogen peroxide products. The device comprises the following parts: a raw material chute, an active carbon pre-mixer, a microfiltration and ultrafiltration filter, a distillation column formed by a plurality of columns connected in series, a reverse osmosis device, a nanofilter, a finished product receiver, a pump and a shaft; wherein, the raw material chute outlet is connected with the active carbon pre-mixer inlet; the microfiltration and ultrafiltration filter outlet is connected with the pump, the outlet of which is connected with the inlet of the distillation column formed by a plurality of columns connected in series; the outlet of the distillation column formed by a plurality of columns connected in series is connected with the inlet of the reverse osmosis device, the outlet of which is connected with the shaft; the outlet of the shaft is connected with the inlet of the nanofilter, the outlet of which is connected with the finished product receiver.

Description

technical field [0001] The invention relates to a process for producing ultra-high-purity hydrogen peroxide. The ultra-high-purity hydrogen peroxide is mainly suitable for cleaning and corrosion in the manufacture of large-scale integrated circuit semiconductor devices in the microelectronics industry. Background technique [0002] Ultra-clean and high-purity chemical reagents, also known as microelectronic chemicals, are key basic materials in the processing and manufacturing of the microelectronics industry, and are mainly used for cleaning and etching during the microprocessing of integrated circuits (IC). Its purity and cleanliness have a very significant impact on the yield, electrical performance and reliability of integrated circuits. With the continuous improvement of IC storage content, the capacity is also increasing, so the oxide film becomes thinner. However, alkali metal impurities in microelectronic chemicals, such as sodium (Na), calcium (Ca), and other impur...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B15/013
Inventor 孙岳明蒋伟戈士勇
Owner JIANGYIN RUNMA ELECTRONICS MATERIAL
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