Balance mass movement device based on five-rod device and its control method

A technology of balancing mass and five-bar mechanism, applied in electric controller, control using feedback, exposure device in photoengraving process, etc., it can solve the problems that ordinary linear motors do not have, and achieve high control accuracy, compensation and offset additional rotation. Moment, cost reduction effect

Inactive Publication Date: 2008-10-22
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology

[0005] For multi-degree-of-freedom positioning table drive control using linear motor control, it is necessary to develop a linear motor with lateral clearance and displacement. Ordinary linear motors do not have this function

Method used

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  • Balance mass movement device based on five-rod device and its control method
  • Balance mass movement device based on five-rod device and its control method
  • Balance mass movement device based on five-rod device and its control method

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Embodiment Construction

[0045] The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings.

[0046] Such as figure 1 As shown, the control strategy of the balance mass positioning control system is designed based on the optimized double-crank five-bar linkage motion actuator. The present invention provides two control modes: independent motion mode and following motion mode. In the independent motion mode, the balance mass can realize single-axis motion with X / Y / Rz degrees of freedom according to its own independent trajectory planning. Module 112 in the figure will realize the absolute coordinate measurement of the bottom balance mass, and module 111 will realize the relative displacement measurement of the long-stroke load relative to the bottom balance mass. Module 101 is a long-stroke X-direction set value generator that realizes the X-direction motion control of the silicon wafer carrier through the controller 105; the balanc...

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Abstract

The invention provides a balance mass moving device based on a five-rod mechanism and a method for controlling the same, wherein, the functions of accompany movement compensation and independent movement reset of a double-layer balance mass system of a workpiece table are realized by controlling four torque motors in the double-layer balance mass system of the workpiece table; the double-crank five-rod movement actuating unit is improved by adoption of the dual structure design method, and complete decoupling of the mechanism movement is realized; a corresponding actuator system, a corresponding measuring system and systematic master control are worked out according to the dual structure design method; and the movement control precision in the balance mass horizontal direction is improved through an optimized decoupling algorithm so as to guarantee that the Rz-oriented precision reaches the microradian precision.

Description

technical field [0001] The invention relates to a movement device of photolithography equipment, in particular to a balance mass movement device of photolithography equipment. Background technique [0002] The production process of lithography machine is a series of extremely complex, expensive and time-consuming lithography process, and the lithography accuracy and productivity of lithography machine directly determine the design and manufacture of lithography equipment. As the market's demand for photolithography productivity increases, it is also required to improve and enhance the exposure quality and exposure accuracy of the system. In the context of this technical demand, major foreign lithography equipment manufacturers have adopted balanced quality control technology to overcome and break through the restrictions on productivity and system accuracy caused by the external reaction force when the workpiece table of the lithography machine moves. [0003] The balanced ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G05B11/32G05D3/12
Inventor 吴立伟邹恒杉吕洋袁志扬陈锐
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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