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Method for purifying using micro-channel

A microchannel and purity technology, applied in the field of purification using microchannel devices, can solve the problems of potential safety hazards in the storage of a large number of compounds, difficulties in operability, and difficulties in scale-up

Inactive Publication Date: 2009-01-21
ROHM & HAAS CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

For many applications, a column of this size makes scale-up difficult, presents operability difficulties, and can lead to safety concerns due to storage of large quantities of compounds

Method used

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  • Method for purifying using micro-channel

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Embodiment Construction

[0013] As used herein, "microchannel device" means a microstructured device (typically, but not exclusively) having a three-dimensional structure (channels or spaces for fluid flow), with dimensions perpendicular to the direction of flow typically ranging from 0.1- 5,000 microns, more specifically 10-1000 microns.

[0014] There are a variety of fabrication techniques and construction materials for the microchannel devices of the present invention. Some materials of construction include, but are not limited to, metals, polymers, silicon, ceramics, and glasses. Table 1 below shows some fabrication techniques that can be used for various microchannel devices:

[0015] Table 1

[0016] Metal

polymer

silicon

ceramics

Glass

mechanical micromachining

molding

lithography

Ceramic Injection Molding

isotropic etching

laser micromachining

injection molding

Anisotropic Dry Etching

strip casting

photoli...

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Abstract

The present invention relates to a purification method using a microchannel device, and especially relates to a method for removing impurities from compounds with same volatility and forming an ultra-high purity compound. The method comprises a step of separating at least one target compound with at least one impurity compound in at least one microchannel device. The relative volatility of the at least one target compound and the at least one impurity compound is less than or equal to 1.2. The purity which is obtained by the at least one target compound is 99.99%.

Description

[0001] Related Application Cross Reference [0002] This application claims priority under 35 U.S.C. §119(e) to U.S. Provisional Patent Application No. 60 / 961,370, filed July 20, 2007, and U.S. Provisional Patent Application No. 61,065,473, filed February 12, 2008. technical field [0003] The present invention relates to methods of removing impurities from compounds having a relative volatility of 1.2 or less, thereby forming ultra-high purity compounds. Background technique [0004] There are many unmet needs for ultra-high purity compounds as feedstocks, intermediates, solvents or final products in materials processing and applications. In this paper, ultra-high purity is defined as a purity with a lower limit of 10 -10 % by weight (1 ppt) to an upper limit of 0.01 % by weight (100 ppm). These compounds include, but are not limited to, distillable organics, including monomers, solvents for chromatographic applications (eg, HPLC), sublimable solids, electronic chemicals,...

Claims

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Application Information

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IPC IPC(8): B01D17/00B01D3/00B01D15/00B01D53/04
CPCC23C16/4402C07F5/062C07F7/00C07F5/006C07F7/28C07F7/30C07B63/00C07F15/0046C23C16/18B01D3/14C23C16/00C07F5/061C07F5/069C07F5/00B33Y80/00Y02P20/54C07F5/06
Inventor F·J·利派克S·G·马罗尔多D·V·谢奈-卡特哈特R·A·韦尔
Owner ROHM & HAAS CO
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