A series of
noble metal organometallic complexes of the general formula (I): MLaXb(FBC)c, wherein M is a
noble metal such as
iridium,
ruthenium or
osmium, and L is a neutral ligand such as carbonyl,
alkene or
diene; X is an anionic ligand such as
chloride,
bromide,
iodide and trifluoroacetate group; and FBC is a fluorinated bidentate chelate ligand such as beta diketonate, beta-ketoiminate, amino-alcoholate and amino-alcoholate ligand, wherein a is an integer of from zero (0) to three (3), b is an integer of from zero (0) to one (1) and c is an 10 integer of from one (1) to three (3). The resulting
noble metal complexes possess enhanced volatility and
thermal stability characteristics, and are suitable for
chemical vapor deposition(CVD) applications. The corresponding noble
metal complex is formed by treatment of the FBC ligand with a less volatile
metal halide. Also disclosed are CVD methods for using the noble
metal complexes as source reagents for deposition of noble metal-containing films such as Ir, Ru and Os, or even metal
oxide film materials IrO2, OsO2 and RuO2.