Organic/inorganic hybrid nanometer porous anti-reflection coating

An anti-reflection coating and nanoporous technology, applied in coatings, optics, instruments, etc., can solve problems such as poor mechanical properties and unstable optical properties, and achieve the effects of easy film thickness, excellent mechanical properties, and solving adhesion problems

Inactive Publication Date: 2009-02-11
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, the skeleton of the coating is mainly composed of Si-O-Si structure and contains Si-OH functional groups, so the coating has higher strength than a single film, anti-wrinkle, anti-friction, good adhesion to the substrate, etc. It can effectively overcome the problems of poor mechanical properties and unstable optical properties of various anti-reflection coatings.

Method used

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  • Organic/inorganic hybrid nanometer porous anti-reflection coating
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Examples

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Embodiment 1

[0025] Make poly(methyl methacrylate-b-methacryloxypropyltriethylsilane) into 5% tetrahydrofuran solution, add 0.1g ethyl orthosilicate, and then use KW-4A desktop homogenizer Spin-coat the surface of the glass slide to form a nano-scale film. The speed of the first stage of homogenization is controlled at 1000r / min for 15s, and the speed of the second stage of homogenization is controlled at 3000r / min for 60s. After smearing, place the film in a saturated atmosphere of tetrahydrofuran, solvent anneal for 4 days, then place the film in a vacuum oven at 90°C for 36 hours, and immediately cool it with ice cubes after the annealing time is over. After cooling, place it in an atmosphere of ammonia water for 24 hours, then dry it naturally for 3 days, and then put it in a vacuum oven at 50° C. for 5 days. Then take it out and place it under the ultraviolet lamp of UV-40w for 5 hours. The various property parameters of the organic / inorganic hybrid nanoporous anti-reflection coating...

Embodiment 2

[0029] Make poly(methyl methacrylate-b-methacryloxypropyltriethylsilane) into 5% tetrahydrofuran solution, add 0.05g ethyl orthosilicate, and then use KW-4A desktop homogenizer Spin-coat the surface of the glass slide to form a nano-scale film. The speed of the first stage of homogenization is controlled at 1000r / min for 15s, and the speed of the second stage of homogenization is controlled at 3000r / min for 60s. After smearing, place the film in a saturated atmosphere of tetrahydrofuran, solvent anneal for 4 days, then place the film in a vacuum oven at 90°C for 36 hours, and immediately cool it with ice cubes after the annealing time is over. After cooling, place it in an atmosphere of ammonia water for 24 hours, then dry it naturally for 3 days, and then put it in a vacuum oven at 50° C. for 5 days. Then take it out and place it under the ultraviolet lamp of UV-40w for 5 hours.

Embodiment 3

[0031] Methyl acrylate-b-methacryloxypropyl triethylsilane) was made into 10% tetrahydrofuran solution, and then spin-coated into a nano-scale film on the surface of a glass slide with a KW-4A desktop glue homogenizer, and the glue was evenly coated. In the first stage, the speed is controlled at 1000r / min, and the time is 15s. In the second stage, the speed of the uniform glue is controlled at 3000r / min, and the time is 60s. After smearing, place the film in a saturated atmosphere of tetrahydrofuran, solvent anneal for 4 days, then place the film in a vacuum oven at 90°C for 36 hours, and immediately cool it with ice cubes after the annealing time is over. After cooling, place it in an atmosphere of ammonia water for 24 hours, then dry it naturally for 3 days, and then put it in a vacuum oven at 50° C. for 5 days. Then take it out and place it under the ultraviolet lamp of UV-40w for 5 hours.

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Abstract

The invention discloses an organic/inorganic hybrid nanometer porous anti-reflection coating layer; the organic/inorganic hybrid nanometer porous anti-reflection coating layer, with the thickness of 42.5-162.8nm, porosity of 23.2%-56.9% and aperture of 5-10nm, is gained through a sol-gel process by taking poly-(methyl methacrylate-b- methacryloxypropyltriethoxysilane) as precursor or through the sol-gel process by taking the mixture of the poly-(methyl methacrylate-b-methacryloxypropyltriethoxysilane) and tetraethyl orthosilicate; the invention takes the micro-phase morphology of the block copolymer after the micro-phase separation as a template so as to prepare the organic/inorganic hybrid nanometer porous anti-reflection coating layer; the aperture size is easy to be controlled; furthermore, the distribution of the aperture is uniform, and the basic framework of the anti-reflection layer has Si-O-Si structure; the organic/inorganic hybrid nanometer porous anti-reflection coating layer has excellent mechanical performance, creasing resistance and friction resistance, is rich in Si-OH functional group and can effectively solve the adhesion problem caused by anti-reflection coating layers and various substrates prepared by the prior art.

Description

technical field [0001] The invention relates to an organic-inorganic / hybrid nanoscale porous anti-reflection film and a preparation method thereof. Background technique [0002] Anti-reflective coatings can increase the light transmittance of optical devices, reduce unnecessary reflections and glare, and are used in important applications in solar panels, display devices, and prevention of light pollution. At present, the main ways to suppress the reflected light are: 1) By polishing the substrate, it can form a diffuse reflection of the incident light, but the effect of this treatment method is not good, there is still a reflectivity of 2%, and the light transmission is greatly reduced. 2) Coating a layer of anti-reflection coating on the surface of the substrate (anti-reflection mechanism such as figure 1 shown). The basic principle of the anti-reflection coating is to allow the reflected light at the interface between the coating and the air to interfere with the reflec...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D133/12C09D143/04G02B1/11G02B1/111
Inventor 王果罗英武
Owner ZHEJIANG UNIV
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