Multi-mode programmable arc ion plating apparatus controlled by rotary lateral magnetic field

A technology of arc ion plating and transverse magnetic field, applied in ion implantation plating, sputtering plating, vacuum evaporation plating, etc. Spot discharge and other problems

Inactive Publication Date: 2009-02-11
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this method needs to add a complex mechanical control mechanism; at the same time, the position of the magnetic field is fixed and the intensity is difficult to adjust. It is only a mechanical movement that causes the change of the distributio

Method used

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  • Multi-mode programmable arc ion plating apparatus controlled by rotary lateral magnetic field
  • Multi-mode programmable arc ion plating apparatus controlled by rotary lateral magnetic field
  • Multi-mode programmable arc ion plating apparatus controlled by rotary lateral magnetic field

Examples

Experimental program
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Example Embodiment

[0076] Example 1:

[0077] An important feature of arc ion plating is that the arc spot discharge forms a high-temperature area near it, and at the same time it radiates to other places in the vacuum chamber, and the space in the vacuum chamber is limited, and the space around the target is also limited, so arc source When designing, it will be difficult to break through if the thinking is limited to the limited space in the vacuum chamber. Especially for the design of the rotating magnetic field that controls the motion of the arc spot, placing the rotating magnetic field generator around the target in the vacuum chamber will involve restrictions on size and material. Although conditions permit, better results can be achieved, but For industrial production, large areas of deposition are required, and long-term work will be restricted. Facing a wider range of simple applications, new innovations and breakthroughs are needed.

[0078] Figure 3(a)-3(c) It is a schematic diagram of ...

Example Embodiment

[0086] Example 2:

[0087] Since arc ion plating mainly relies on the discharge of the cathode spots on the target surface to deposit the required film, it is a point source, so there is the problem of uneven distribution of plasma in the transmission space, resulting in uneven film deposition. Embodiment 2 is the same as Embodiment 1, except that a focusing magnetic field is applied near the back of the substrate holder to improve the plasma distribution in the transmission space, increase the ion density at the substrate, and increase the deposition rate and deposition uniformity. Figure 5 It is a schematic diagram of the arc ion plating deposition equipment controlled by the rotating magnetic field in Example 2. The specific structure is as follows:

[0088] Arc ion plating deposition equipment mainly includes target material 2, rotating magnetic field device 6, water outlet pipe 9, arc ignition coil 10, water outlet 11, water inlet 12, electromagnetic coil 13, nickel-plated p...

Example Embodiment

[0091] Example 3:

[0092] The difference from embodiment 1 or 2 is:

[0093] Figure 7(a)-Figure 7(b) It is a schematic diagram of the arc ion plating arc source controlled by the rotating magnetic field in Example 3. Among them, FIG. 7(a) is a schematic diagram of the rotating magnetic field generating device 6. Embodiment 3 is a two-phase electrically controlled rotating magnetic field generator. The four magnetic poles 4 are evenly distributed on the circular closed main magnetic channel to form an integral electromagnetic loop skeleton. The shape of the magnetic poles is square or round. According to the size of the space between the main magnetic channel and the target material 2, the frame material is made of high permeability material (electrical pure iron or superimposed stamped silicon steel sheet). The top end of the magnetic pole 4 is straight or arc-shaped, and points symmetrically to the center of the surface of the target 2. FIG. 7(b) is a schematic diagram of the ...

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Abstract

The invention relates to the field of film preparation, in particular to an arc ion plating device which controls arc point movement by a rotary magnetic field and is controlled by a rotary transverse magnetic field with the multi-mode programmable modulation. The device is provided with a target material, a rotary magnetic field generating device, an electromagnetic coil, an insulating bush, a flange, a vacuum chamber and a matrix holder, wherein, the matrix holder and the target material are arranged inside the vacuum chamber, the front face of the target material is opposite to the matrix holder, the back of the target material is provided with electromagnetic coils, the rotary magnetic field generating device arranged outside the vacuum chamber is sheathed on a flange sleeve or an furnace body tube around the target material, and insulation is used for protection between the rotary magnetic field generating device and the flange sleeve or the furnace body tube. By controlling the arc point movement by the rotary transverse magnetic field with the multi-mode programmable modulation, the arc ion plating device can improve the discharge mode and the operating stability of the arc point, improve the etching uniformity and the utilization rate of the target material and reduce the large particle emission of the target material. The arc ion plating device is used for preparing high-quality films and functional films and expanding the application range of the arc ion plating.

Description

technical field [0001] The invention relates to the field of thin film preparation, in particular to an arc ion plating device controlled by a rotating transverse magnetic field controlled by a rotating magnetic field using a rotating magnetic field to control the movement of the arc spot. form, control the movement of the arc spot, improve the uniformity of target etching, reduce or inhibit the emission of large particles of the target, and prepare high-quality thin films. Background technique [0002] Arc ion plating is one of the most important technologies in industrial coating production and scientific research. Due to its simple structure, high ionization rate (70%-80%), high energy of incident particles, good diffraction, it can realize low temperature deposition, etc. A series of advantages have enabled the arc ion plating technology to develop rapidly and be widely used, showing great economic benefits and industrial application prospects. [0003] Arc ion plating ...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/54
Inventor 肖金泉郎文昌孙超宫骏赵彦辉闻立时
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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