Method for preparing polysilicon
A production method, polysilicon technology, applied in chemical instruments and methods, halogenated silanes, silicon compounds, etc., can solve problems such as serious environmental pollution, large material consumption, and enterprise losses, and achieve the goal of solving environmental pollution problems and reducing pollutants Generate, reduce spawn and amount effects
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Embodiment 1
[0023] refer to figure 1 , which shows a flow chart of an improved polysilicon production method that can be applied according to an embodiment of the present invention. The polysilicon production process of the present invention uses industrial silicon and hydrogen chloride (HCl) as the main raw materials, and generates the following by controlling the reaction conditions. Trichlorosilane (SiHCl 3 )-based mixture of chlorosilane and hydrogen, and then trichlorosilane (SiHCl 3 ) after being purified, sent to the reduction furnace to make trichlorosilane (SiHCl 3 ) and auxiliary material hydrogen (H 2 ) reaction, reduction to generate polysilicon.
[0024] In the process of the above-mentioned industrial production of polysilicon, the tail gas produced mainly includes hydrogen (H 2 ), hydrogen chloride (HCl), and chlorosilanes, which mainly include dichlorodihydrosilane (SiH 2 Cl 2 ), trichlorosilane (SiHCl 3 ) and silicon tetrachloride (SiCl 4 ).
[0025] The main rea...
Embodiment 2
[0037] Refer below figure 2 An improved polysilicon production method according to a second embodiment of the present invention is described. figure 2 Shown is the flow chart according to the second embodiment of the present invention, and the main difference between this embodiment and the above-mentioned first embodiment is that it also includes hydrogen chloride (HCl) and silicon tetrachloride (SiCl) adsorbed in the activated carbon. 4 ) recovery process.
[0038] Specifically, hydrogen chloride (HCl) and chlorosilane (here, the main component of the chlorosilane is silicon tetrachloride (SiCl) 4 )) is heated to a temperature of about 80-180°C, thereby improving the movement activity of gas molecules, and then using, for example, high-purity hydrogen (H 2 ) will be heated gaseous hydrogen chloride (HCl) and chlorosilane (here, the main component of the chlorosilane is silicon tetrachloride (SiCl 4 )) blowing out (carrying out), it should be noted that the above tempera...
Embodiment 3
[0040] Refer below image 3 An improved polysilicon production method according to a third embodiment of the present invention will be described. refer to image 3 , The main difference between the third embodiment of the present invention and the above-mentioned first and second embodiments is: it also includes the use of liquid silicon tetrachloride (SiCl 4 ) a step of rinsing the tail gas.
[0041] In the traditional wet tail gas treatment process, the tail gas is usually rinsed with water. The purpose is to wash the hydrogen chloride (HCl) in the tail gas into the water, and part of the unrecovered chlorosilane is hydrolyzed into Hydrogen chloride and silicon dioxide hydrate, such sewage needs to be treated separately, resulting in large material consumption and serious environmental pollution, which limits large-scale industrial production.
[0042] According to an embodiment of the present invention, the washing process uses liquid silicon tetrachloride (SiCl 4 ), th...
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