Production method and special equipment for zinc oxide aluminum transparent electroconductive film
A technology of transparent conductive film and zinc oxide aluminum, which is applied in the preparation of zinc aluminum oxide transparent conductive film, special equipment for realizing the above preparation method, and the field of conductive film preparation, which can solve the problem that the substrate is not resistant to high temperature, the substrate is curled and deformed, and cannot reach AZO film with high light transmission and good conductivity
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[0030] In order to make the above-mentioned and other purposes, features and advantages of the present invention more obvious and understandable, the preferred embodiments are specifically cited below, and in conjunction with the accompanying drawings, the detailed description is as follows: Please refer to figure 1 As shown, the zinc-aluminum oxide transparent conductive thin film equipment of the present invention is mainly capable of plating an AZO thin film at room temperature. Among them, the vacuum sputtering chamber 1 is mainly equipped with an ion sputtering gun 2, a target 3 fixed by a target fixing base 4, and a plated product 5. The plated product 5 is sputtered by an ion beam in the vacuum sputtering chamber 1. Sputtering is carried out in the interior, and it can be plated under the condition of high vacuum at room temperature (the high vacuum condition is: 1.3 x 10 -2 ~6.6 x 10 -2 Pa), and use one ion sputtering gun 2 to plate the same or multiple materials simu...
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