Zirconium silicon oxide thin film with high dielectric coefficient, and preparation and use thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- NANJING UNIV
- Publication Date
- 2009-07-08
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the field of microelectronic materials, in particular to a (ZrO 2 ) x (SiO 2 ) 1-x Thin films and methods for their preparation. Background technique
[0002] Memory systems currently used by computers include volatile memory and nonvolatile memory. The former is mostly used in the internal memory of the computer system, and cannot save data when there is no power support. The latter can completely save the original data when there is no power support, so it is widely used in data storage of electronic systems, such as computers, digital equipment, industrial control equipment, etc. Currently used non-volatile memory magnetic media storage cannot achieve fast reading and writing because the magnetic head and the recording medium need to move mechanically during the reading and writing process. Electronic storage technologies such as Flash do not require mechanical components, but due to the use of thicker tunneling layers...