Method for on-line measuring young modulus of MEMS film based on resonance frequency method

A technology of resonant frequency and Young's modulus, which is applied in the field of online measurement of Young's modulus of micro-electromechanical system thin films and online measurement of Young's modulus of MEMS thin films based on the resonant frequency method, which can solve the problems that affect the success of the test and the measurement error , did not take into account the influence of film stress gradient and other issues

Active Publication Date: 2009-07-29
常熟紫金知识产权服务有限公司
View PDF0 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the nano-indentation method will damage the film; the electrostatic absorption method will cause measurement errors due to the accumulation of static electricity after repeated measurements, and it is only suitable for measuring conductive materials; the bubbling me

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for on-line measuring young modulus of MEMS film based on resonance frequency method
  • Method for on-line measuring young modulus of MEMS film based on resonance frequency method
  • Method for on-line measuring young modulus of MEMS film based on resonance frequency method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0040] specific implementation plan

[0041] The present invention will be described in further detail below in conjunction with specific examples and accompanying drawings.

[0042] In actual measurement, such as figure 2 As shown, after depositing a thin layer of SiO 2 On the monocrystalline silicon substrate 2 of layer 4 and silicon nitride layer 5, a layer of phosphosilicate glass (BPSG) with a thickness of 2 μm is deposited as a sacrificial layer 6 by low-pressure chemical vapor deposition (LPCVD), and the sacrificial layer 6 is deposited by photolithography Etch a circular concave hole 7 with a diameter of 2.4 μm on the sacrificial layer, and then deposit a layer of polysilicon film with a thickness of h=0.5 μm as the structural layer 8, centering on the circular concave hole on the sacrificial layer, on the structural layer etch a radius r 0 The center of =25 μm is fixed on the circular MEMS thin film 1 (as figure 1 As shown), after removing the sacrificial layer w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method for online measurement of MEMS film young modulus based on a resonant frequency method. The method comprises the following steps: making a center fixed round MEMS film with the radius of r0 and the thickness of h, and fixing an anchor zone of the film on a plane substrate; measuring the resonant frequency f of the center fixed round MEMS film by a micro-motion analyzer; and calculating the young modulus E of the film material. In the method, the center fixed round film with symmetrical center is taken as a test structure and the anchor zone is nearly clamped ideally, thus improving the model precision. The tested film structure can not be damaged in the test process by adopting a non-contact resonant frequency measurement method and the film structure has good repeatability. The method is applicable to measuring the young modulus of conducting materials and non-conducting materials. Furthermore, the measurement method also has the advantages of simple operation, high measurement accuracy, small chip area and the like.

Description

technical field [0001] The invention relates to a method capable of online measuring the Young's modulus of a microelectromechanical system (MEMS) film, specifically a method for online measuring the Young's modulus of a MEMS film based on a resonance frequency method, and belongs to the technical field of MEMS material parameter measurement. Background technique [0002] The application fields of MEMS technology are very broad, and can be used in many fields such as inertial measurement, microfluidics, optics (optical switches, display devices, etc.), pressure measurement, and RF devices. [0003] Thin films are widely used device materials in MEMS. Among the various performance parameters of MEMS films, Young's modulus is the most basic and very important material parameter, which is essential in the research of related MEMS devices. However, due to different film processing techniques and changes in processing conditions, the Young's modulus of the film will also change a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01N3/00
Inventor 戎华陈涵王鸣
Owner 常熟紫金知识产权服务有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap