Super-precision trans-scale in-situ nanometer indentation marking test system

A nano-indentation and testing system technology, applied in the direction of testing the hardness of materials, measuring devices, instruments, etc., can solve the problems of nano-scale deformation, inability to test three-dimensional specimens, and many offline operations

Active Publication Date: 2009-09-02
JILIN UNIV
View PDF0 Cites 69 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Regarding ex-situ mechanical testing techniques such as nanoindentation and nanoscratch, A.M.Minor and others from the University of California, Berkeley and Lawrence-Berkeley National Laboratory pointed out their shortcomings: due to the inability to use scanning electron microscopy and transmission electron microscopy High-resolution in-situ monitoring is carried out under (SEM, TEM), so it is impossible to study the correlation between deformation, damage, load and material performance parameters; There is a lack of in-depth research on the correlation law between performance parameters, which is urgently needed in the design and manufacture of tiny components
Limited to the technical level at that time, the device had a large structure and insufficient positioning accuracy; it could only monitor the deformation behavior and damage of the material, but could not test the mechanical parameters; Scale deformation and damage mechanism issues become possible
Since then, the researchers have pushed the doped diamond tool head through the piezoelectric drive mechanism to realize the in-situ nano-indentation test in the vacuum chamber of the electron microscope, and conducted experiments on single crystal silicon and other materials, and monitored the indentation load of the material. The whole process of deformation and internal defects, but their work also has some deficiencies: ①The amount of deformation (or displacement) is obtained through electron microscope observation, ②The loading force is obtained by the voltage applied to the piezoelectric element and the amount of deformation It is obtained through the conversion of the relationship; thus resulting in complex testing, too many offline operations, and reducing the credibility of the test results
But this research also has some deficiencies: ① there is an insurmountable backlash phenomenon in the driving mechanism (the backlash amplitude reaches 30-100nm); ② the loading resolution is insufficient (100mN), ③ tangential scratches cannot be detected force
At present, the commercial products of in-situ nanomechanical testing are only produced by Hysitron Company of the United States, which are very expensive and are also embargoed to my country; Parts must also be manufactured through complex and cumbersome processes such as "mask, corrosion, deposition", etc., and it is impossible to test three-dimensional specimens with feature sizes above millimeters
Due to factors such as scale effects in the test, it is not credible to use the test results of extremely small specimens to evaluate the comprehensive mechanical properties of larger-sized three-dimensional specimens

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Super-precision trans-scale in-situ nanometer indentation marking test system
  • Super-precision trans-scale in-situ nanometer indentation marking test system
  • Super-precision trans-scale in-situ nanometer indentation marking test system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The details of the present invention and its specific implementation will be further described below in conjunction with the embodiments shown in the accompanying drawings.

[0036] In the high-performance comprehensive precision experimental system of the present invention, the stage with precise positioning of the X and Y axes is arranged horizontally on the base, and a precision micro-motion stage is used as the drive in the direction of the Y-axis, driven by the slide table of the micro-motion stage The X-axis precision positioning mechanism on the slide table, the micro-motion table has a large load-carrying capacity, runs smoothly and is easy to control. The X-axis precision positioning mechanism is driven by a voice coil motor, and a precision displacement sensor is used to detect micro-displacement. By feeding back the micro-displacement signal to the control power supply of the voice coil motor, closed-loop control can be realized, and precise positioning in the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a super-precision trans-scale in-situ nanometer indentation marking test system which integrates driving, loading, detecting and micro-nanometer dynamic performance tests, super-precision marking processing and in-situ observation into a whole. The system mainly comprises an objective table, a regulation mechanism, a detection unit, a precise pressed-into driving unit, a detection unit of load signals and displacement signals and a high-resolution digital microscopic imaging system, wherein the objective table is precisely positioned along the directions of the X axis and the Y axis; the regulation mechanism and the precise pressed-into driving unit are in the direction of the Z axis and are assembled on a base; the high-resolution digital microscopic imaging system is used for observing the deforming and damaging conditions of the material in the storing and testing process; the objective table as well as the regulation mechanism and the precise pressed-into driving unit in the direction of the Z axis are assembled on a base; the high-resolution digital microscopic imaging system is arranged on the objective table; a precise dynamic sensor detecting the pressure of a diamond tool head pressed into a material and a sensor I detecting the precise displacement of the objective table in the directions of the X axis and the Y axis are arranged on the objective table; and a sensor II used for detecting the precise displacement of a diamond tool head in the direction of the Z axis of pressed-into depth is arranged on the base by a support I.

Description

technical field [0001] The invention relates to a high-performance comprehensive precision experimental testing system integrating driving, loading, detection, micro-nano mechanical performance testing, ultra-precision scribing processing and in-situ observation, especially related to the micromechanics of various test pieces or materials. The device for nano-indentation / scratch experiment, in-situ nano-indentation / scratch experiment and micro-nano-scale in-situ diamond scribing processing in the performance test is a precision scientific instrument integrating opto-mechanical and electrical integration. Precision instruments are the cornerstone and important guarantee for scientific and technological innovation and economic and social development. This invention is a special testing instrument for measuring and characterizing microscopic mechanical performance parameters of various test pieces or materials, and can be used in high-resolution digital microscopic imaging systems...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01N3/46G01B11/16
Inventor 赵宏伟黄虎邓金强赵宏健
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products